⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3269071 | 0.87 | TSHR (0.32) | — | |
| SCHEMBL433929 | 0.74 | MGAM (0.30) | — | |
| Bromide SCHEMBL495676 | 0.71 | — | — | |
| Ethane SCHEMBL18528767 | 0.71 | — | — | |
| Hydrochloric Acid SCHEMBL232158 | 0.71 | — | — | |
| Methane SCHEMBL18528719 | 0.71 | — | — | |
| Iodide SCHEMBL9486260 | 0.71 | — | — | |
| SCHEMBL29281681 | 0.70 | TSHR (0.32) | — | |
| SCHEMBL27737164 | 0.69 | ALDH1A1 (0.31) | — | |
| SCHEMBL427710 | 0.68 | GAA (0.48) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117396811-A | Composition for forming underlayer film of silicon-containing resist | 日产化学株式会社 | 2024-01-12 | — | — | CN | disclosed |
| CN-117396810-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2024-01-12 | — | — | CN | disclosed |
| CN-117083570-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2023-11-17 | — | — | CN | disclosed |
| CN-116547343-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2023-08-04 | — | — | CN | disclosed |