Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Terephthalic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.60 |
| ▸ | POLB | P06746 | 3/20 | 0.60 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.60 |
| ▸ | HPGD | P15428 | 1/20 | 0.60 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.60 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.60 |
| ▸ | RXRA | P19793 | 1/20 | 0.54 |
| ▸ | RXRB | P28702 | 1/20 | 0.54 |
| ▸ | RXRG | P48443 | 1/20 | 0.54 |
| ▸ | HTT | P42858 | 1/20 | 0.54 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.53 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.53 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.53 |
| ▸ | TP53 | P04637 | 1/20 | 0.52 |
| ▸ | GAA | P10253 | 1/20 | 0.52 |
| ▸ | MAPT | P10636 | 1/20 | 0.52 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.50 |
| ▸ | MEN1 | O00255 | 2/20 | 0.50 |
| ▸ | AKR1B10 | O60218 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoic Acid SCHEMBL29049235 | 0.97 | HSD17B10 (0.56) | HSD17B10POLBALDH1A1HPGDCTDSP1 | |
| Isophthalic Acid SCHEMBL29049251 | 0.92 | HDAC1 (0.51) | HSD17B10POLBALDH1A1HPGDCTDSP1 | |
| Bicarbonate SCHEMBL29049243 | 0.91 | HSD17B10 (0.58) | HSD17B10POLBALDH1A1HPGDHTT | |
| Oxalic Acid SCHEMBL29049203 | 0.89 | HSD17B10 (0.56) | HSD17B10POLBALDH1A1HPGDHTT | |
| Acetic Acid SCHEMBL29049224 | 0.89 | HSD17B10 (0.56) | HSD17B10POLBALDH1A1HPGDHTT | |
| Phthalic Acid SCHEMBL29049255 | 0.88 | KMT2A (0.61) | HSD17B10POLBALDH1A1HPGDCTDSP1 | |
| Malonic Acid SCHEMBL29049213 | 0.88 | HSD17B10 (0.55) | HSD17B10POLBALDH1A1HPGDHTT | |
| SCHEMBL2232108 | 0.87 | HSD17B10 (0.60) | HSD17B10POLBHPGDHTTTP53 | |
| Propionic Acid SCHEMBL29049218 | 0.87 | HSD17B10 (0.54) | HSD17B10POLBALDH1A1HTTHDAC8 | |
| Hydrochloric Acid SCHEMBL4373569 | 0.86 | HSD17B10 (0.58) | HSD17B10POLBHPGDHTTTP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112286000-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-12-03 | — | — | CN | disclosed |
| CN-111856882-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-11-29 | — | — | CN | disclosed |
| CN-114660896-B | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2024-06-11 | — | — | CN | disclosed |
| CN-116804825-A | Composition for forming silicon-containing metal hard mask and pattern forming method | 信越化学工业株式会社 | 2023-09-26 | — | — | CN | disclosed |
| CN-111458980-B | Composition for forming underlayer film of silicon-containing resist and method for forming pattern | 信越化学工业株式会社 | 2023-08-11 | — | — | CN | disclosed |