Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.61 |
| ▸ | MEN1 | O00255 | 2/20 | 0.61 |
| ▸ | LMNA | P02545 | 2/20 | 0.61 |
| ▸ | AKR1B10 | O60218 | 1/20 | 0.61 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.61 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.61 |
| ▸ | DHFR | P00374 | 1/20 | 0.61 |
| ▸ | MPO | P05164 | 1/20 | 0.61 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.61 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.61 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.61 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.61 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.61 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.61 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.61 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.61 |
| ▸ | AKR1C2 | P52895 | 1/20 | 0.61 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.61 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.61 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.61 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Salicylic Acid SCHEMBL29049273 | 0.92 | HSD17B10 (0.58) | KMT2AMEN1LMNAAKR1B10TRPA1 | |
| Bicarbonate SCHEMBL29049243 | 0.91 | HSD17B10 (0.58) | KMT2AMEN1LMNAAKR1B10TRPA1 | |
| Oxalic Acid SCHEMBL29049203 | 0.89 | HSD17B10 (0.56) | KMT2AMEN1LMNAAKR1B10TRPA1 | |
| Acetic Acid SCHEMBL29049224 | 0.89 | HSD17B10 (0.56) | KMT2AMEN1LMNAAKR1B10TRPA1 | |
| Terephthalic Acid SCHEMBL29049219 | 0.88 | HSD17B10 (0.60) | KMT2AMEN1LMNAAKR1B10TRPA1 | |
| Benzoic Acid SCHEMBL29049235 | 0.88 | HSD17B10 (0.56) | KMT2AMEN1LMNAAKR1B10TRPA1 | |
| Malonic Acid SCHEMBL29049213 | 0.88 | HSD17B10 (0.55) | KMT2AMEN1LMNAAKR1B10TRPA1 | |
| SCHEMBL2232108 | 0.87 | HSD17B10 (0.60) | KMT2AMEN1LMNACYP1A2CYP3A4 | |
| Propionic Acid SCHEMBL29049218 | 0.87 | HSD17B10 (0.54) | KMT2AMEN1LMNAAKR1B10TRPA1 | |
| Hydrochloric Acid SCHEMBL4373569 | 0.86 | HSD17B10 (0.58) | LMNAHSD17B10POLBHPGDTP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112286000-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-12-03 | — | — | CN | disclosed |
| CN-111856882-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-11-29 | — | — | CN | disclosed |
| CN-114660896-B | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2024-06-11 | — | — | CN | disclosed |
| CN-116804825-A | Composition for forming silicon-containing metal hard mask and pattern forming method | 信越化学工业株式会社 | 2023-09-26 | — | — | CN | disclosed |
| CN-111458980-B | Composition for forming underlayer film of silicon-containing resist and method for forming pattern | 信越化学工业株式会社 | 2023-08-11 | — | — | CN | disclosed |