Propanol

Propanol

SCHEMBL29074

CCCO.COOC(C)=O

nearest known ligand 0.38

Full drug profile on Sugi Atlas →

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.38
LMNA P02545 1/20 0.38
HSD17B10 Q99714 1/20 0.38
TSHR P16473 2/20 0.32
TDP1 Q9NUW8 1/20 0.32
MGAM O43451 1/20 0.31
GAA P10253 1/20 0.31
SI P14410 1/20 0.31
MGAM2 Q2M2H8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Alcohol SCHEMBL7007847 0.89
Ethylene Glycol SCHEMBL4817329 0.89 ALDH1A1 (0.42) ALDH1A1LMNAHSD17B10TSHRMGAM
Butyl Alcohol SCHEMBL11341268 0.88 ALDH1A1 (0.50) ALDH1A1LMNAHSD17B10TSHR
SCHEMBL305079 0.83
Acetic Acid Methyl Ester SCHEMBL467959 0.80
Di(Hydroxyethyl)Ether SCHEMBL3698560 0.80 TSHR (0.48) ALDH1A1TSHR
SCHEMBL9585374 0.80
SCHEMBL4479247 0.80
SCHEMBL5055634 0.80
SCHEMBL5860426 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 297 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110722623-B Cutting protection structure 拓旷(上海)光电科技有限公司 2021-07-27 CN claimed
CN-104272193-B Diluent composition 株式会社东进世美肯 2019-08-23 CN claimed
US-8975318-B2 Halogen-free benzoxazine based curable compositions for high TG applications HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2015-03-10 US claimed
EP-2819642-A1 PATTERNED NAIL VARNISH COMPOSITION Fiabila (FR) 2015-01-07 EP claimed
CN-104272193-A diluent composition DONGJIN SEMICHEM CO LTD 2015-01-07 CN claimed
US-8912259-B2 Formulated benzoxazine based system for transportation applications HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2014-12-16 US claimed
EP-2609136-B1 FORMULATED BENZOXAZINE BASED SYSTEM FOR TRANSPORTATION APPLICATIONS HUNTSMAN ADV MAT AMERICAS INC (US) 2014-11-26 EP claimed
WO-2013128126-A1 PATTERNED NAIL VARNISH COMPOSITION FIABILA (FR) 2013-09-06 WO claimed
EP-2609136-A1 FORMULATED BENZOXAZINE BASED SYSTEM FOR TRANSPORTATION APPLICATIONS Huntsman Advanced Materials Americas LLC (US) 2013-07-03 EP claimed
US-20130143457-A1 Formulated Benzoxazine Based System for Transportation Applications HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2013-06-06 US claimed
EP-1697985-A1 COMBINATIONS OF RESIN COMPOSITIONS AND METHODS OF USE THEREOF GENERAL ELECTRIC COMPANY (US) 2006-09-06 EP claimed
US-20060147719-A1 Curable epoxy composition with colloidal silica and phenolic resins on substrates MOMENTIVE PERFORMANCE MATERIALS INC. 2006-07-06 US claimed
EP-1665375-A1 SOLVENT-MODIFIED RESIN COMPOSITIONS AND METHODS OF USE THEREOF General Electric Company, (a New York Corporation) (US) 2006-06-07 EP claimed
EP-1665376-A1 SOLVENT-MODIFIED RESIN SYSTEM CONTAINING FILLER THAT HAS HIGH Tg, TRANSPARENCY AND GOOD RELIABILITY IN WAFER LEVEL UNDERFILL APPLICATIONS GENERAL ELECTRIC COMPANY (US) 2006-06-07 EP claimed
WO-2005062369-A1 COMBINATIONS OF RESIN COMPOSITIONS AND METHODS OF USE THEREOF GENERAL ELECTRIC COMPANY (US) 2005-07-07 WO claimed
US-20050131106-A1 Combinations of resin compositions and methods of use thereof MOMENTIVE PERFORMANCE MATERIALS INC. 2005-06-16 US claimed
WO-2005024938-A1 SOLVENT-MODIFIED RESIN COMPOSITIONS AND METHODS OF USE THEREOF GENERAL ELECTRIC COMPANY (US) 2005-03-17 WO claimed
WO-2005024939-A1 SOLVENT-MODIFIED RESIN SYSTEM CONTAINING FILLER THAT HAS HIGH Tg, TRANSPARENCY AND GOOD RELIABILITY IN WAFER LEVEL UNDERFILL APPLICATIONS GENERAL ELECTRIC COMPANY (US) 2005-03-17 WO claimed
US-20050049352-A1 Solvent-modified resin compositions and methods of use thereof GENERAL ELECTRIC COMPANY 2005-03-03 US claimed
US-20050049334-A1 Solvent-modified resin system containing filler that has high Tg, transparency and good reliability in wafer level underfill applications GENERAL ELECTRIC COMPANY 2005-03-03 US claimed