Ethylene Glycol

Ethylene Glycol

SCHEMBL4817329

COOC(C)=O.OCCO

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.42
TSHR P16473 2/20 0.35
LMNA P02545 1/20 0.35
HSD17B10 Q99714 1/20 0.35
MGAM O43451 1/20 0.33
GAA P10253 1/20 0.33
SI P14410 1/20 0.33
MGAM2 Q2M2H8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Propanol SCHEMBL29074 0.89 ALDH1A1 (0.38) ALDH1A1TSHRLMNAHSD17B10MGAM
Alcohol SCHEMBL7007847 0.88
SCHEMBL305079 0.87
Di(Hydroxyethyl)Ether SCHEMBL3698560 0.85 TSHR (0.48) ALDH1A1TSHR
SCHEMBL4408235 0.84
SCHEMBL9585374 0.84
SCHEMBL4479247 0.84
SCHEMBL5860426 0.84
SCHEMBL5055634 0.84
SCHEMBL28456811 0.84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7405459-B2 Semiconductor device comprising porous film SHIN-ETSU CHEMICAL CO. LTD. (JP) 2008-07-29 US disclosed
US-20080118737-A1 excels in dielectric properties, adhesion, film consistency, mechanical strength, easily thinned; made from an amorphous polymer made by hydrolyzing and condensing an silane compoundl, and and a zeolite sol made with a quaternary ammonium hydroxide SHIN-ETSU CHEMICAL CO. LTD. 2008-05-22 US disclosed
US-7309722-B2 excels in dielectric properties, adhesion, film consistency, mechanical strength, easily thinned; made from an amorphous polymer made by hydrolyzing and condensing an silane compoundl, and and a zeolite sol made with a quaternary ammonium hydroxide SHIN-ETSU CHEMICAL CO. LTD. (JP) 2007-12-18 US disclosed
US-7244657-B2 Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device SHIN-ETSU CHEMICAL CO. LTD. (JP) 2007-07-17 US disclosed
US-20070108593-A1 Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device OGIHARA TSUTOMU 2007-05-17 US disclosed
US-20040105986-A1 excels in dielectric properties, adhesion, film consistency, mechanical strength, easily thinned; made from an amorphous polymer made by hydrolyzing and condensing an silane compoundl, and and a zeolite sol made with a quaternary ammonium hydroxide PANASONIC CORPORATION (JP) 2004-06-03 US disclosed
US-20040091419-A1 Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2004-05-13 US disclosed
US-5541052-A HAVING EMULSION LAYER CONTAINING NORMAL CRYSTAL SILVER HALIDE GRAINS WITH CONCAVE CRYSTAL FACE AND CORE/SHELL STRUCTURE WITH DIFFERENT COMPOSITION IN EACH KONICA CORPORATION (JP) 1996-07-30 US disclosed
EP-0643327-A1 Silver halide photographic light-sensitive material KONICA CORPORATION (JP) 1995-03-15 EP disclosed
EP-0244184-B1 Light-sensitive silver halide photographic material KONISHIROKU PHOTO IND (JP) 1993-12-15 EP disclosed
EP-0536663-A1 Dye image forming method KONICA CORPORATION (JP) 1993-04-14 EP disclosed
EP-0255983-B1 RAPIDLY PROCESSABLE SILVER HALIDE COLOR PHOTOSENSITIVE MATERIAL KONICA CORPORATION (JP) 1993-03-17 EP disclosed
EP-0190512-B1 POSITIVE IMAGE FORMING METHOD KONICA CORPORATION (JP) 1992-09-30 EP disclosed
EP-0410383-A1 Silver halide photographic material having improved keeping quality KONICA CORPORATION (JP) 1991-01-30 EP disclosed
US-4868089-A ANHYDROUS HEAT TREATMENT TO INCREASE SENSITIVITY OF SILVER HALIDE EMULSION KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1989-09-19 US disclosed
US-4818671-A CONTAINING GOLD COMPOUND, SULFUR SENSITIZER, CYANINE DYE KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1989-04-04 US disclosed
EP-0255983-A2 Rapidly processable silver halide color photosensitive material KONICA CORPORATION (JP) 1988-02-17 EP disclosed
EP-0244184-A2 Light-sensitive silver halide photographic material KONICA CORPORATION (JP) 1987-11-04 EP disclosed
EP-0190512-A2 Positive image forming method KONICA CORPORATION (JP) 1986-08-13 EP disclosed