Acetic Acid

Acetic Acid

SCHEMBL29076

CC(=O)O.CCC(O)OC

nearest known ligand 0.46

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.46
FFAR3 O14843 2/20 0.37
LCK P06239 1/20 0.37
FYN P06241 1/20 0.37
SLC1A3 P43003 1/20 0.36
SLC1A2 P43004 1/20 0.36
SLC1A1 P43005 1/20 0.36
ALDH1A1 P00352 3/20 0.32
LMNA P02545 1/20 0.32
HSD17B10 Q99714 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
CA2 P00918 2/20 0.31
CA1 P00915 1/20 0.31
MGAM O43451 1/20 0.31
GAA P10253 1/20 0.31
SI P14410 1/20 0.31
MGAM2 Q2M2H8 1/20 0.31
TP53 P04637 1/20 0.30
MAPK1 P28482 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetone SCHEMBL7668393 0.92 TSHR (0.48) TSHRSLC1A3SLC1A2SLC1A1ALDH1A1
Acetic Acid Methyl Ester SCHEMBL3409715 0.87 ALDH1A1 (0.50) TSHRSLC1A3SLC1A2SLC1A1ALDH1A1
Butanone SCHEMBL3857935 0.87 ALDH1A1 (0.50) TSHRFFAR3SLC1A3SLC1A2SLC1A1
SCHEMBL13611580 0.86
SCHEMBL16668528 0.86
SCHEMBL20648 0.86
Butanone SCHEMBL3678047 0.85 ALDH1A1 (0.48) TSHRALDH1A1TDP1MGAMGAA
SCHEMBL5487434 0.83
Methyl Alcohol SCHEMBL14861497 0.83
Magnesium SCHEMBL31182158 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 527 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107428708-B Benzoxazine low temperature curable compositions 亨斯迈先进材料美国有限责任公司 2021-11-09 CN claimed
CN-110722623-B Cutting protection structure 拓旷(上海)光电科技有限公司 2021-07-27 CN claimed
CN-110903473-A Preparation method of degradable hyperbranched dispersant 苏州禾川化学技术服务有限公司 2020-03-24 CN claimed
CN-110722623-A Cutting protection structure 上海自旭光电科技有限公司 2020-01-24 CN claimed
CN-104272193-B Diluent composition 株式会社东进世美肯 2019-08-23 CN claimed
US-8975318-B2 Halogen-free benzoxazine based curable compositions for high TG applications HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2015-03-10 US claimed
EP-2819642-A1 PATTERNED NAIL VARNISH COMPOSITION Fiabila (FR) 2015-01-07 EP claimed
CN-104272193-A diluent composition DONGJIN SEMICHEM CO LTD 2015-01-07 CN claimed
US-8912259-B2 Formulated benzoxazine based system for transportation applications HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2014-12-16 US claimed
EP-2609136-B1 FORMULATED BENZOXAZINE BASED SYSTEM FOR TRANSPORTATION APPLICATIONS HUNTSMAN ADV MAT AMERICAS INC (US) 2014-11-26 EP claimed
WO-2005062369-A1 COMBINATIONS OF RESIN COMPOSITIONS AND METHODS OF USE THEREOF GENERAL ELECTRIC COMPANY (US) 2005-07-07 WO claimed
US-20050131106-A1 Combinations of resin compositions and methods of use thereof MOMENTIVE PERFORMANCE MATERIALS INC. 2005-06-16 US claimed
WO-2005024938-A1 SOLVENT-MODIFIED RESIN COMPOSITIONS AND METHODS OF USE THEREOF GENERAL ELECTRIC COMPANY (US) 2005-03-17 WO claimed
WO-2005024939-A1 SOLVENT-MODIFIED RESIN SYSTEM CONTAINING FILLER THAT HAS HIGH Tg, TRANSPARENCY AND GOOD RELIABILITY IN WAFER LEVEL UNDERFILL APPLICATIONS GENERAL ELECTRIC COMPANY (US) 2005-03-17 WO claimed
US-20050049334-A1 Solvent-modified resin system containing filler that has high Tg, transparency and good reliability in wafer level underfill applications GENERAL ELECTRIC COMPANY 2005-03-03 US claimed
US-20050049352-A1 Solvent-modified resin compositions and methods of use thereof GENERAL ELECTRIC COMPANY 2005-03-03 US claimed
US-6605666-B1 Stable alcohol and water dispersion of oligomeric polyactive hydrogen component, polyisocyanate and an ionic moiety; rapidly forms film when applied to skin; fluid resistance; strong adhesion 3M INNOVATIVE PROPERTIES COMPANY 2003-08-12 US claimed
EP-1309640-A1 POLYURETHANE FILM-FORMING DISPERSIONS IN ALCOHOL-WATER SYSTEM 3M Innovative Properties Company (US) 2003-05-14 EP claimed
WO-2002010242-A1 POLYURETHANE FILM-FORMING DISPERSIONS IN ALCOHOL-WATER SYSTEM 3M INNOVATIVE PROPERTIES COMPANY (US) 2002-02-07 WO claimed
EP-0533159-A1 Aqueous dispersions of fluorinated polyurethanes SYREMONT S.p.A. (IT) 1993-03-24 EP claimed