SCHEMBL29109571

SCHEMBL29109571

C=C(O)C(=O)Oc1cccc2cc3ccccc3cc12

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 7/20 0.46
▸ KDM4E B2RXH2 7/20 0.46
▸ GAA P10253 3/20 0.46
▸ HSD17B10 Q99714 6/20 0.44
▸ HPGD P15428 4/20 0.44
▸ KMT2A Q03164 6/20 0.43
▸ MEN1 O00255 5/20 0.43
▸ CYP1A2 P05177 1/20 0.43
▸ GLA P06280 1/20 0.43
▸ CYP2C19 P33261 1/20 0.43
▸ PGR P06401 1/20 0.42
▸ PTGS1 P23219 1/20 0.42
▸ MAPK1 P28482 1/20 0.42
▸ RAB9A P51151 1/20 0.41
▸ L3MBTL1 Q9Y468 1/20 0.41
▸ MAPT P10636 4/20 0.40
▸ HTT P42858 1/20 0.40
▸ TDP1 Q9NUW8 3/20 0.40
▸ FABP7 O15540 3/20 0.39
▸ FABP3 P05413 3/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7134423 0.87 ELANE (0.46) ALDH1A1KDM4EGAAHSD17B10HPGD
SCHEMBL29420740 0.87 ELANE (0.46) ALDH1A1KDM4EGAAHSD17B10HPGD
SCHEMBL8075767 0.86 ALDH1A1 (0.49) ALDH1A1KDM4EGAAHSD17B10HPGD
SCHEMBL27952882 0.85 ELANE (0.45) ALDH1A1KDM4EGAAHSD17B10HPGD
SCHEMBL29733196 0.85 ELANE (0.45) ALDH1A1KDM4EGAAHSD17B10HPGD
SCHEMBL29733360 0.85 ELANE (0.45) ALDH1A1KDM4EGAAHSD17B10HPGD
SCHEMBL29733276 0.85 ELANE (0.45) ALDH1A1KDM4EGAAHSD17B10HPGD
SCHEMBL19468524 0.84 ALDH1A1 (0.50) ALDH1A1KDM4EGAAHSD17B10HPGD
SCHEMBL29591103 0.84 ALDH1A1 (0.50) ALDH1A1KDM4EGAAHSD17B10HPGD
SCHEMBL11672675 0.83 ALDH1A1 (0.41) ALDH1A1KDM4EGAAHSD17B10HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117089259-A Preparation method of anti-reflection coating resin at bottom of photoresist 合肥汉旸科技材料有限公司 2023-11-21 — — CN disclosed
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