SCHEMBL8075767

SCHEMBL8075767

O=C(O)Oc1cccc2cc3ccccc3cc12

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 7/20 0.49
▸ KDM4E B2RXH2 7/20 0.49
▸ GAA P10253 3/20 0.49
▸ HSD17B10 Q99714 6/20 0.46
▸ HPGD P15428 4/20 0.46
▸ KMT2A Q03164 6/20 0.46
▸ MEN1 O00255 5/20 0.46
▸ CYP1A2 P05177 1/20 0.46
▸ GLA P06280 1/20 0.46
▸ CYP2C19 P33261 1/20 0.46
▸ PGR P06401 1/20 0.45
▸ PTGS1 P23219 1/20 0.45
▸ MAPK1 P28482 1/20 0.45
▸ RAB9A P51151 1/20 0.44
▸ L3MBTL1 Q9Y468 1/20 0.44
▸ MAPT P10636 4/20 0.42
▸ HTT P42858 1/20 0.42
▸ TDP1 Q9NUW8 3/20 0.42
▸ FABP7 O15540 3/20 0.41
▸ FABP3 P05413 3/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11297972 0.94 ALDH1A1 (0.50) ALDH1A1KDM4EGAAHSD17B10HPGD
SCHEMBL19468524 0.87 ALDH1A1 (0.50) ALDH1A1KDM4EGAAHSD17B10HPGD
SCHEMBL29591103 0.87 ALDH1A1 (0.50) ALDH1A1KDM4EGAAHSD17B10HPGD
SCHEMBL11300044 0.86 NQO1 (0.52) ALDH1A1KDM4EGAAHSD17B10HPGD
SCHEMBL29109571 0.86 ALDH1A1 (0.46) ALDH1A1KDM4EGAAHSD17B10HPGD
SCHEMBL28339440 0.85 ALDH1A1 (0.49) ALDH1A1KDM4EGAAHSD17B10HPGD
SCHEMBL2393984 0.85 ALDH1A1 (0.49) ALDH1A1KDM4EGAAHSD17B10HPGD
SCHEMBL27977417 0.84 KMT2A (0.59) ALDH1A1KDM4EGAAHSD17B10KMT2A
Naphthalene SCHEMBL1132213 0.84 HSD17B10 (0.55) ALDH1A1KDM4EGAAHSD17B10HPGD
SCHEMBL1394553 0.84 ALDH1A1 (0.47) ALDH1A1KDM4EGAAHSD17B10HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105885037-B A kind of production equipment and method of polyamide 5X 上海凯赛生物技术股份有限公司 2019-12-03 — — CN disclosed
CN-110117835-A Nylon fiber and preparation method thereof 上海凯赛生物技术研发中心有限公司 2019-08-13 — — CN disclosed
CN-110117832-A Nylon fiber and preparation method thereof 上海凯赛生物技术研发中心有限公司 2019-08-13 — — CN disclosed
CN-110117831-A Nylon fiber and preparation method thereof 上海凯赛生物技术研发中心有限公司 2019-08-13 — — CN disclosed
CN-110117833-A Nylon fiber and preparation method thereof 上海凯赛生物技术研发中心有限公司 2019-08-13 — — CN disclosed
CN-110117834-A Nylon fiber and preparation method thereof 上海凯赛生物技术研发中心有限公司 2019-08-13 — — CN disclosed
CN-109972228-A The preparation method of polyamide and its nylon fiber of preparation 上海凯赛生物技术研发中心有限公司 2019-07-05 — — CN disclosed
CN-106884217-B Nylon fiber and preparation method thereof 上海凯赛生物技术研发中心有限公司 2019-06-21 — — CN disclosed
CN-104562271-B Nylon fiber and preparation method thereof 上海凯赛生物技术研发中心有限公司 2019-05-31 — — CN disclosed
CN-105885040-B It is used to prepare the device of polyamide, the production equipment of Prepolymerizing process and polyamide, production method 上海凯赛生物技术研发中心有限公司 2019-05-10 — — CN disclosed
CN-204779449-U Polyamide 5X's production facility CATHAY RANDD CT CO LTD 2015-11-18 — — CN disclosed
CN-105013196-A Apparatus for preparing polyamide, raw material concentration method as well as production equipment and production method for preparing polyamide CATHAY IND BIOTECH LTD 2015-11-04 — — CN disclosed
CN-105013205-A Apparatus for preparing polyamide, pressure reducing method as well as production equipment and production method for polyamide CATHAY RANDD CT CO LTD 2015-11-04 — — CN disclosed
CN-104562271-A Nylon fiber and preparation method thereof SHANGHAI CATHAY BIOTECHNOLOGY RES CT CO LTD 2015-04-29 — — CN disclosed
CN-102046859-B Polyamide 56 filament, and fiber structure and air-bag base cloth each comprising the same TORAY INDUSTRIES 2013-09-25 — — CN disclosed
CN-102046859-A Polyamide 56 filament, and fiber structure and air-bag base cloth each comprising the same TORAY INDUSTRIES 2011-05-04 — — CN disclosed
US-6071670-A PHOTORESIST RESIN COMPRISING PHOTOACID GENERATING COMPOUND AND AN ACID HYDROLYZABLE OLIGOMER HAVING ALICYCLIC OR POLYCONDENSED AROMATIC BACKBONE; ALKALI DEVELOPMENT WITH HIGH RESOLUTION, DRY ETCH RESISTANCE KABUSHIKI KAISHA TOSHIBA (JP) 2000-06-06 — — US disclosed
EP-0126029-B1 IMAGE-FORMING PROCESS CIBA-GEIGY AG (CH) 1987-08-26 — — EP disclosed
EP-0062611-B1 PHOTOPOLYMERISATION PROCESS CIBA-GEIGY AG (CH) 1985-04-24 — — EP disclosed
EP-0062611-A2 Photopolymerisation process CIBA-GEIGY AG (CH) 1982-10-13 — — EP disclosed
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