SCHEMBL29136539

SCHEMBL29136539

C=Cc1ccc(OC(C)=O)cc1OC

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A1 P04798 2/20 0.53
CYP1B1 Q16678 2/20 0.53
ALDH1A1 P00352 4/20 0.53
MAPT P10636 4/20 0.50
MEN1 O00255 2/20 0.50
KMT2A Q03164 2/20 0.50
TUBB4A P04350 2/20 0.49
TUBB P07437 2/20 0.49
TUBA3C P0DPH7 2/20 0.49
TUBA1B P68363 2/20 0.49
TUBA4A P68366 2/20 0.49
TUBB4B P68371 2/20 0.49
TUBB3 Q13509 2/20 0.49
TUBB2A Q13885 2/20 0.49
TUBB8 Q3ZCM7 2/20 0.49
TUBA3E Q6PEY2 2/20 0.49
TUBA1A Q71U36 2/20 0.49
TUBA1C Q9BQE3 2/20 0.49
TUBB6 Q9BUF5 2/20 0.49
TUBB2B Q9BVA1 2/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29136553 0.90 ALDH1A1 (0.53) CYP1A1CYP1B1ALDH1A1MAPTMEN1
SCHEMBL3627110 0.90 KDM4E (0.56) CYP1A1CYP1B1ALDH1A1MAPTMEN1
SCHEMBL30785274 0.90 KDM4E (0.56) CYP1A1CYP1B1ALDH1A1MAPTMEN1
SCHEMBL29136552 0.89 ALDH1A1 (0.54) CYP1A1CYP1B1ALDH1A1MAPTMEN1
SCHEMBL3292760 0.87 ALDH1A1 (0.71) CYP1A1CYP1B1ALDH1A1MAPTMEN1
SCHEMBL3618003 0.83 KDM4E (0.47) CYP1A1CYP1B1ALDH1A1MAPTMEN1
SCHEMBL18318758 0.83 LMNA (0.47) ALDH1A1MAPTMEN1KMT2ATUBB4A
SCHEMBL27939631 0.82 GLA (0.44) CYP1A1CYP1B1ALDH1A1MAPTMEN1
SCHEMBL31074934 0.81 CYP1A1 (0.57) CYP1A1CYP1B1ALDH1A1MAPTMEN1
SCHEMBL30664488 0.81 ELANE (0.48) CYP1A1CYP1B1ALDH1A1MAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117362164-A Photoresist monomer compound and preparation method and application thereof 中节能万润股份有限公司 2024-01-09 CN disclosed