SCHEMBL2914113

SCHEMBL2914113

CCCCNC(=O)c1cc(C(=O)NCCCC)cc(C(=O)NCCCC)c1

nearest known ligand 0.79

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.79
TSHR P16473 1/20 0.60
HTT P42858 1/20 0.60
NAAA Q02083 2/20 0.59
L3MBTL1 Q9Y468 1/20 0.58
HPGD P15428 1/20 0.51
MEN1 O00255 1/20 0.51
KMT2A Q03164 1/20 0.51
MLYCD O95822 1/20 0.51
ALDH1A1 P00352 2/20 0.50
MMP2 P08253 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20991401 0.96 SMN1; SMN2 (0.73) SMN1; SMN2TSHRHTTNAAAL3MBTL1
SCHEMBL9979205 0.94 SMN1; SMN2 (0.70) SMN1; SMN2TSHRHTTNAAAL3MBTL1
SCHEMBL9979317 0.92 NAAA (0.71) SMN1; SMN2NAAAL3MBTL1MEN1KMT2A
SCHEMBL1978767 0.92 NAAA (0.71) SMN1; SMN2NAAAL3MBTL1MEN1KMT2A
SCHEMBL1977288 0.92 NAAA (0.71) SMN1; SMN2NAAAL3MBTL1MEN1KMT2A
SCHEMBL9978782 0.92 NAAA (0.71) SMN1; SMN2NAAAL3MBTL1MEN1KMT2A
SCHEMBL9979011 0.92 NAAA (0.71) SMN1; SMN2NAAAL3MBTL1MEN1KMT2A
SCHEMBL6437809 0.92 NAAA (0.71) SMN1; SMN2NAAAL3MBTL1MEN1KMT2A
SCHEMBL19326796 0.92 NAAA (0.71) SMN1; SMN2NAAAL3MBTL1MEN1KMT2A
SCHEMBL19326794 0.92 NAAA (0.71) SMN1; SMN2NAAAL3MBTL1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4502081-A1 THERMOPLASTIC RESIN COMPOSITION Kaneka Corporation (JP) 2025-02-05 EP disclosed
EP-2862883-B1 METHOD FOR PRODUCING NUCLEATOR MASTERBATCH ADEKA CORP (JP) 2019-09-25 EP disclosed
US-9732198-B2 Mono- and multi-layer blown films BASF SE (DE) 2017-08-15 US disclosed
US-20170081486-A1 Mono- and Multi-Layer Blown Films BASF SE (DE) 2017-03-23 US disclosed
US-20160136871-A1 Mono- and Multi-Layer Blown Films BASF SE (DE) 2016-05-19 US disclosed
US-9278487-B2 Mono-and multi-layer blown films BASF SE (DE) 2016-03-08 US disclosed
US-9243127-B2 Method for producing nucleator masterbatch ADEKA CORPORATION (JP) 2016-01-26 US disclosed
US-20150152248-A1 METHOD FOR PRODUCING NUCLEATOR MASTERBATCH ADEKA CORPORATION (JP) 2015-06-04 US disclosed
EP-2862883-A1 METHOD FOR PRODUCING NUCLEATOR MASTERBATCH Adeka Corporation (JP) 2015-04-22 EP disclosed
US-8492468-B2 Polypropylene resin composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-23 US disclosed
US-20120184170-A1 Electret Materials CHIN HUI (US) 2012-07-19 US disclosed
US-20110301268-A1 POLYPROPYLENE RESIN COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-12-08 US disclosed
US-20110230109-A1 Electret Materials CHIN HUI 2011-09-22 US disclosed
US-20110230109-A1 Electret Materials CHIN HUI 2011-09-22 US disclosed
EP-2026965-B1 MONO- AND MULTI-LAYER BLOWN FILMS BASF SE (DE) 2010-09-01 EP disclosed
WO-2010069854-A2 MODIFIED POLYOLEFIN WAXES BASF SE (DE) 2010-06-24 WO disclosed
US-20090208718-A1 Mono-and multi-layer blown films CIBA CORP. 2009-08-20 US disclosed
WO-2008122525-A1 ELECTRET MATERIALS BASF SE (CH) 2008-10-16 WO disclosed
US-20080249269-A1 Electret materials CIBA CORP. 2008-10-09 US disclosed
US-20080249269-A1 Electret materials CIBA CORP. 2008-10-09 US disclosed