Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30772125 | 0.98 | ALDH1A1 (0.33) | ALDH1A1 | |
| Ammonia Solution, Strong SCHEMBL29155291 | 0.98 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL29155298 | 0.98 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL29155331 | 0.89 | ALDH1A1 (0.37) | ALDH1A1 | |
| Ammonia Solution, Strong SCHEMBL29155325 | 0.87 | ALDH1A1 (0.36) | ALDH1A1 | |
| SCHEMBL30772127 | 0.87 | ALDH1A1 (0.36) | ALDH1A1 | |
| SCHEMBL29155330 | 0.87 | ALDH1A1 (0.36) | ALDH1A1 | |
| Fluoride SCHEMBL9443598 | 0.84 | ALDH1A1 (0.39) | ALDH1A1 | |
| SCHEMBL4613660 | 0.82 | THRB (0.35) | ALDH1A1 | |
| SCHEMBL13898883 | 0.82 | THRB (0.35) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120158302-A | Novel etching solution formula in semiconductor material etching process | 浙江伊诺环保集团股份有限公司 | 2025-06-17 | — | — | CN | claimed |
| CN-117757477-A | Formula of etching solution and application thereof | 浙江工业大学 | 2024-03-26 | — | — | CN | claimed |
| CN-117510963-A | Polyether polyol microemulsion, preparation method and application thereof | 浙江诺亚氟化工有限公司 | 2024-02-06 | — | — | CN | claimed |
| CN-120158302-A | Novel etching solution formula in semiconductor material etching process | 浙江伊诺环保集团股份有限公司 | 2025-06-17 | — | — | CN | disclosed |
| CN-117757477-A | Formula of etching solution and application thereof | 浙江工业大学 | 2024-03-26 | — | — | CN | disclosed |