Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LPAR3 | Q9UBY5 | 6/20 | 0.52 |
| ▸ | LPAR2 | Q9HBW0 | 3/20 | 0.52 |
| ▸ | LPAR1 | Q92633 | 2/20 | 0.47 |
| ▸ | CETP | P11597 | 5/20 | 0.46 |
| ▸ | GGPS1 | O95749 | 1/20 | 0.42 |
| ▸ | FAAH | O00519 | 1/20 | 0.41 |
| ▸ | TRPM8 | Q7Z2W7 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3868497 | 1.00 | LPAR3 (0.52) | LPAR3LPAR2LPAR1CETPGGPS1 | |
| SCHEMBL27511763 | 1.00 | LPAR3 (0.52) | LPAR3LPAR2LPAR1CETPGGPS1 | |
| SCHEMBL29007221 | 1.00 | LPAR3 (0.52) | LPAR3LPAR2LPAR1CETPGGPS1 | |
| SCHEMBL30360777 | 1.00 | LPAR3 (0.52) | LPAR3LPAR2LPAR1CETPGGPS1 | |
| SCHEMBL277856 | 0.98 | LPAR3 (0.48) | LPAR3LPAR2LPAR1CETPGGPS1 | |
| SCHEMBL28500058 | 0.92 | LPAR3 (0.41) | LPAR3LPAR2LPAR1CETPGGPS1 | |
| SCHEMBL18114321 | 0.86 | LPAR3 (0.46) | LPAR3LPAR2LPAR1CETPGGPS1 | |
| SCHEMBL28224930 | 0.84 | PPARD (0.35) | LPAR3LPAR2LPAR1GGPS1 | |
| SCHEMBL25345182 | 0.82 | FDPS (0.46) | — | |
| SCHEMBL6014054 | 0.81 | LMNA (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025091614-A1 | CHEMICAL MECHANICAL POLISHING COMPOSITION FOR METAL ALLOY AND POLISHING METHOD THEREFOR | 昂士特科技(深圳)有限公司 | 2025-05-08 | — | — | WO | disclosed |
| CN-119731282-A | Chemical mechanical polishing composition for metal alloy and polishing method thereof | 昂士特科技(深圳)有限公司 | 2025-03-28 | — | — | CN | disclosed |
| CN-117511413-A | Chemical mechanical polishing composition for metal alloy and polishing method thereof | 昂士特科技(深圳)有限公司 | 2024-02-06 | — | — | CN | disclosed |