SCHEMBL2915566

SCHEMBL2915566

Nc1ccccc1N=Nc1ccccc1N

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 5/20 1.00
L3MBTL1 Q9Y468 4/20 1.00
RAB9A P51151 3/20 1.00
GAA P10253 1/20 1.00
CYP3A4 P08684 6/20 0.53
SMN1; SMN2 Q16637 5/20 0.53
ALOX15 P16050 2/20 0.53
CASP1 P29466 1/20 0.53
CASP7 P55210 1/20 0.53
MAPT P10636 6/20 0.46
MEN1 O00255 4/20 0.46
KMT2A Q03164 4/20 0.46
KDM4E B2RXH2 2/20 0.46
LMNA P02545 1/20 0.46
HTT P42858 1/20 0.46
ALDH1A1 P00352 6/20 0.45
TSHR P16473 6/20 0.45
TDP1 Q9NUW8 5/20 0.45
MAPK1 P28482 4/20 0.45
TP53 P04637 2/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30538675 1.00 NPC1 (1.00) NPC1L3MBTL1RAB9AGAACYP3A4
SCHEMBL1389297 1.00 NPC1 (1.00) NPC1L3MBTL1RAB9AGAACYP3A4
SCHEMBL18240065 1.00 NPC1 (1.00) NPC1L3MBTL1RAB9AGAACYP3A4
Hydrochloric Acid SCHEMBL11748662 0.97 NPC1 (0.94) NPC1L3MBTL1RAB9AGAACYP3A4
SCHEMBL590787 0.87 NPC1 (0.76) NPC1L3MBTL1RAB9AGAACYP3A4
SCHEMBL29001132 0.87 NPC1 (0.76) NPC1L3MBTL1RAB9AGAACYP3A4
SCHEMBL434865 0.87 NPC1 (0.76) NPC1L3MBTL1RAB9AGAACYP3A4
SCHEMBL29569176 0.87 NPC1 (0.76) NPC1L3MBTL1RAB9AGAACYP3A4
SCHEMBL8058911 0.86 L3MBTL1 (0.75) NPC1L3MBTL1RAB9AGAACYP3A4
SCHEMBL15221662 0.86 L3MBTL1 (0.75) NPC1L3MBTL1RAB9AGAACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 129 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025118330-A1 ORGANIC ELECTROCATALYST FOR CONVERTING CO2 INTO C3, C2 AND C1 PRODUCTS AND PREPARATION METHOD THEREFOR 苏州翔晖科技有限公司 2025-06-12 WO claimed
CN-112683831-B Copper ion ultraviolet visual detection method based on sulfonamide azo compound and application of copper ion ultraviolet visual detection method in detection test paper 吉林化工学院 2024-01-19 CN claimed
US-4855229-A REACTING O-PHENYLENEDIAMINE AND HYDROGEN PEROXIDE OLYMPUS OPTICAL CO., LTD. (JP) 1989-08-08 US claimed
EP-0026088-B1 PHOTORESIST COMPOSITIONS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-11-23 EP claimed
US-4349619-A CONTAINING ANTIHALATION AGENTS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1982-09-14 US claimed
EP-0026088-A2 Photoresist compositions JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1981-04-01 EP claimed
WO-2025118330-A1 ORGANIC ELECTROCATALYST FOR CONVERTING CO2 INTO C3, C2 AND C1 PRODUCTS AND PREPARATION METHOD THEREFOR 苏州翔晖科技有限公司 2025-06-12 WO disclosed
WO-2025118330-A1 ORGANIC ELECTROCATALYST FOR CONVERTING CO2 INTO C3, C2 AND C1 PRODUCTS AND PREPARATION METHOD THEREFOR 苏州翔晖科技有限公司 2025-06-12 WO disclosed
US-20250180952-A1 PHOTOALIGNING MATERIALS Rolic Technologies AG (CH) 2025-06-05 US disclosed
EP-4493638-A1 PHOTOALIGNING MATERIALS Rolic Technologies AG (CH) 2025-01-22 EP disclosed
WO-2023174773-A1 PHOTOALIGNING MATERIALS Rolic Technologies AG (CH) 2023-09-21 WO disclosed
CN-111253583-B Dilatant hybrid dynamic polymer and dilatant realization method thereof 厦门天策材料科技有限公司 2023-05-16 CN disclosed
US-11634544-B2 Photoaligning materials Rolic Technologies AG (CH) 2023-04-25 US disclosed
US-4526980-A Refluxing o-diaminobenzene and lead dioxide to form diaminoazobenzene, treating with acid, nitrite, alkali metal azide THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) 1985-07-02 US disclosed
US-4517141-A POLYUREAS FROM BISULFITE- MASKED POLYISOCYANATES; PROTECTIVE COLLOIDS BAYER AKTIENGESELLSCHAFT (DE) 1985-05-14 US disclosed
EP-0097910-A2 Microcapsules having walls made from polycondensation products of water-insoluble polyamines and water-soluble adducts of polyisocyanates, their preparation and some applications BAYER AG (DE) 1984-01-11 EP disclosed
EP-0026088-B1 PHOTORESIST COMPOSITIONS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-11-23 EP disclosed
US-4349619-A CONTAINING ANTIHALATION AGENTS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1982-09-14 US disclosed
EP-0026088-A2 Photoresist compositions JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1981-04-01 EP disclosed
US-4074046-A REACTING NITROGENEOUS COMPOUND WITH CARBON MONOXIDE AMERICAN CYANAMID COMPANY (US) 1978-02-14 US disclosed