Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.55 |
| ▸ | THRA | P10827 | 1/20 | 0.45 |
| ▸ | THRB | P10828 | 1/20 | 0.45 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.45 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.45 |
| ▸ | BID | P55957 | 3/20 | 0.42 |
| ▸ | MCL1 | Q07820 | 3/20 | 0.42 |
| ▸ | BCL2L1 | Q07817 | 2/20 | 0.42 |
| ▸ | BAK1 | Q16611 | 2/20 | 0.42 |
| ▸ | KAT8 | Q9H7Z6 | 2/20 | 0.42 |
| ▸ | PPARG | P37231 | 1/20 | 0.42 |
| ▸ | PPARA | Q07869 | 1/20 | 0.42 |
| ▸ | EP300 | Q09472 | 1/20 | 0.42 |
| ▸ | KAT2A | Q92830 | 1/20 | 0.42 |
| ▸ | KAT2B | Q92831 | 1/20 | 0.42 |
| ▸ | KAT5 | Q92993 | 1/20 | 0.42 |
| ▸ | SAE1 | Q9UBE0 | 1/20 | 0.42 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.41 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.41 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL667813 | 1.00 | LIPG (0.55) | LIPGTHRATHRBNR1H2NR1H3 | |
| SCHEMBL677573 | 1.00 | LIPG (0.55) | LIPGTHRATHRBNR1H2NR1H3 | |
| SCHEMBL677129 | 0.98 | LIPG (0.52) | LIPGTHRATHRBNR1H2NR1H3 | |
| SCHEMBL2921344 | 0.92 | CYP3A4 (0.45) | LIPGTHRATHRBNR1H2NR1H3 | |
| SCHEMBL31348033 | 0.85 | LIPG (0.51) | LIPGTHRATHRBNR1H2NR1H3 | |
| SCHEMBL31348025 | 0.85 | LIPG (0.51) | LIPGTHRATHRBNR1H2NR1H3 | |
| SCHEMBL17160025 | 0.85 | LIPG (0.51) | LIPGTHRATHRBNR1H2NR1H3 | |
| SCHEMBL17159999 | 0.85 | LIPG (0.51) | LIPGTHRATHRBNR1H2NR1H3 | |
| SCHEMBL11896275 | 0.85 | LIPG (0.51) | LIPGTHRATHRBNR1H2NR1H3 | |
| SCHEMBL11896269 | 0.85 | LIPG (0.51) | LIPGTHRATHRBNR1H2NR1H3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1467251-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2010-09-08 | — | — | EP | disclosed |
| US-20080096130-A1 | POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION | 2008-04-24 | — | — | US | disclosed |
| US-7361446-B2 | Sensitivity, high resolution, good pattern profile, used for super-microlithography | FUJIFILM CORPORATION (JP) | 2008-04-22 | — | — | US | disclosed |
| EP-1467251-A1 | Positive resist composition | Fuji Photo Film Co., Ltd. (JP) | 2004-10-13 | — | — | EP | disclosed |
| US-20040197702-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2004-10-07 | — | — | US | disclosed |
| US-6727033-B2 | A POSITIVE RESIST COMPOSITION COMPRISING A RESIN (A), WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPING SOLUTION, CONTAINING A STRUCTURAL UNIT INCLUDING A GROUP REPRESENTED BY FORMULA (X) DEFINED IN | FUJI PHOTO FILM CO., LTD. (JP) | 2004-04-27 | — | — | US | disclosed |
| US-20030134221-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-07-17 | — | — | US | disclosed |