SCHEMBL677573

SCHEMBL677573

C[CH]c1ccccc1CCCCCC

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LIPG Q9Y5X9 1/20 0.55
THRA P10827 1/20 0.45
THRB P10828 1/20 0.45
NR1H2 P55055 1/20 0.45
NR1H3 Q13133 1/20 0.45
BID P55957 3/20 0.42
MCL1 Q07820 3/20 0.42
BCL2L1 Q07817 2/20 0.42
BAK1 Q16611 2/20 0.42
KAT8 Q9H7Z6 2/20 0.42
PPARG P37231 1/20 0.42
PPARA Q07869 1/20 0.42
EP300 Q09472 1/20 0.42
KAT2A Q92830 1/20 0.42
KAT2B Q92831 1/20 0.42
KAT5 Q92993 1/20 0.42
SAE1 Q9UBE0 1/20 0.42
KCNH2 Q12809 1/20 0.41
ALOX5 P09917 2/20 0.41
PTGS2 P35354 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL667813 1.00 LIPG (0.55) LIPGTHRATHRBNR1H2NR1H3
SCHEMBL2919192 1.00 LIPG (0.55) LIPGTHRATHRBNR1H2NR1H3
SCHEMBL677129 0.98 LIPG (0.52) LIPGTHRATHRBNR1H2NR1H3
SCHEMBL2921344 0.92 CYP3A4 (0.45) LIPGTHRATHRBNR1H2NR1H3
SCHEMBL31348033 0.85 LIPG (0.51) LIPGTHRATHRBNR1H2NR1H3
SCHEMBL31348025 0.85 LIPG (0.51) LIPGTHRATHRBNR1H2NR1H3
SCHEMBL17160025 0.85 LIPG (0.51) LIPGTHRATHRBNR1H2NR1H3
SCHEMBL17159999 0.85 LIPG (0.51) LIPGTHRATHRBNR1H2NR1H3
SCHEMBL11896275 0.85 LIPG (0.51) LIPGTHRATHRBNR1H2NR1H3
SCHEMBL11896269 0.85 LIPG (0.51) LIPGTHRATHRBNR1H2NR1H3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021107870-A1 ANTIMICROBIAL AGENT, COATING FORMULATION, COMPOSITE SURFACE COATING AND METHODS OF PREPARING THE SAME AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2021-06-03 WO disclosed
US-9802902-B2 Antifungal compound AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2017-10-31 US disclosed
US-20170037013-A1 ANTIFUNGAL COMPOUND AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2017-02-09 US disclosed
US-9493424-B2 Antifungal compound AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2016-11-15 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20150203454-A1 ANTIFUNGAL COMPOUND AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2015-07-23 US disclosed
WO-2014025314-A1 An Antifungal Compound AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2014-02-13 WO disclosed
EP-1367439-B1 Radiation-sensitive composition FUJIFILM CORP (JP) 2012-08-01 EP disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
EP-2399168-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM Corporation (JP) 2011-12-28 EP disclosed
US-6743565-B2 POLYSTYRENE OXY DERIVATIVES THAT DECOMPOSE UNDER AN ACID TO INCREASE THE SOLUBILITY IN AN ALKALI DEVELOPER AND AN ACID GENERATOR FUJI PHOTO FILM CO., LTD. (JP) 2004-06-01 US disclosed
US-6727033-B2 A POSITIVE RESIST COMPOSITION COMPRISING A RESIN (A), WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPING SOLUTION, CONTAINING A STRUCTURAL UNIT INCLUDING A GROUP REPRESENTED BY FORMULA (X) DEFINED IN FUJI PHOTO FILM CO., LTD. (JP) 2004-04-27 US disclosed
US-20040033437-A1 Radiation-sensitive composition FUJI PHOTO FILM CO., LTD. 2004-02-19 US disclosed
US-6692883-B2 GENERATING ACID; ADJUSTMENT SOLUBILITY IN ALKLAINE DEVELOPER FUJI PHOTO FILM CO., LTD. (JP) 2004-02-17 US disclosed
EP-1367439-A1 Radiation-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2003-12-03 EP disclosed
US-6630280-B1 Resin and compound that generates an arylsulfonic acid when exposed to actinic radiation; sensitivity; resolution; smoothness FUJI PHOTO FILM CO., LTD. (JP) 2003-10-07 US disclosed
US-20030134221-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2003-07-17 US disclosed
US-20030108811-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2003-06-12 US disclosed
US-20020012866-A1 Positive photoresist composition FUJIFILM CORPORATION (JP) 2002-01-31 US disclosed
US-6207343-B1 RESIN CONTAINING GROUPS WHICH DECOMPOSE BY THE ACTION OF AN ACID TO ENHANCE ITS SOLUBILITY IN AN ALKALINE DEVELOPING SOLUTION AND A COMPOUND WHICH GENERATES AN ACID UPON IRRADIATION WITH ACTINIC RAYS OR RADIATION FUJI PHOTO FILM CO., LTD. (JP) 2001-03-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150203454-A1 ANTIFUNGAL COMPOUND ERG28, DPM1, BAK1 LIPG 4038/4885THRA 3948/4885THRB 4549/4885
US-20170037013-A1 ANTIFUNGAL COMPOUND ERG28, DPM1, BAK1 LIPG 4038/4885THRA 3948/4885THRB 4549/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.