Methacrylic Acid

Methacrylic Acid

SCHEMBL29197945

C=C(C)C(=O)O.FC(F)C(F)C(F)C(F)C(F)(F)F

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL6131143 0.85 TDP1 (0.31)
Methacrylic Acid SCHEMBL27560581 0.83 TDP1 (0.35)
Methacrylic Acid SCHEMBL28737040 0.82
Methacrylic Acid SCHEMBL9455908 0.78
Acrylic Acid SCHEMBL29157305 0.78 LMNA (0.42)
SCHEMBL1735853 0.75
Methacrylic Acid SCHEMBL28486169 0.74 TDP1 (0.32)
Methacrylic Acid SCHEMBL2273966 0.73 TET2 (0.32)
Methacrylic Acid SCHEMBL27813495 0.73
SCHEMBL9392667 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118667454-B Perovskite photovoltaic packaging material and preparation method thereof 苏州市新广益电子股份有限公司 2025-09-09 CN disclosed
CN-115403696-B Alkali-soluble resin, protective layer composition, protective layer, laminate, and method for forming resist pattern 达兴材料股份有限公司 2024-10-11 CN disclosed
CN-118667092-A Water-retaining sand-fixing agent and preparation method thereof 成都理工大学 2024-09-20 CN disclosed
CN-118234326-A Display device 三星显示有限公司 2024-06-21 CN disclosed
CN-117772159-A Preparation method of high specific surface area reversed phase chromatography stationary phase 济南大学 2024-03-29 CN disclosed