SCHEMBL1735853

SCHEMBL1735853

FC(F)C(F)C(F)C(F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9392667 0.97
SCHEMBL2480072 0.97
SCHEMBL6889629 0.97
SCHEMBL336105 0.89
Sulfuric Acid SCHEMBL5489262 0.84 CA5A (0.30)
Acrylic Acid SCHEMBL29157305 0.76 LMNA (0.42)
Methacrylic Acid SCHEMBL29197945 0.75
SCHEMBL8731604 0.73
SCHEMBL3011769 0.73
SCHEMBL5186383 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 192 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4692032-A2 SYSTEMS AND METHODS FOR REDUCING THE FORMATION OF IMPURITIES DURING 244BB DEHYDROCHLORINATION TO 1234YF Honeywell International Inc. (US) 2026-02-11 EP claimed
EP-3737660-B1 SYSTEMS AND METHODS FOR REDUCING THE FORMATION OF IMPURITIES DURING 244BB DEHYDROCHLORINATION TO 1234YF HONEYWELL INT INC (US) 2025-11-05 EP claimed
CN-118105662-A Lithium ion battery fire extinguishing agent and preparation method and application thereof 武汉三氟新材料科技有限公司 2024-05-31 CN claimed
CN-117986083-A Compositions comprising 2-chloro-1, 2-tetrafluoropropane (HCFC-244 bb) 霍尼韦尔国际公司 2024-05-07 CN claimed
CN-117986081-A System and method for reducing impurity formation during dehydrochlorination of 244bb to 1234yf 霍尼韦尔国际公司 2024-05-07 CN claimed
CN-117986080-A System and method for reducing impurity formation during dehydrochlorination of 244bb to 1234yf 霍尼韦尔国际公司 2024-05-07 CN claimed
CN-117986082-A Compositions comprising 2-chloro-1, 2-tetrafluoropropane (HCFC-244 bb) 霍尼韦尔国际公司 2024-05-07 CN claimed
EP-3737660-A1 SYSTEMS AND METHODS FOR REDUCING THE FORMATION OF IMPURITIES DURING 244BB DEHYDROCHLORINATION TO 1234YF Honeywell International Inc. (US) 2020-11-18 EP claimed
EP-3737659-A1 COMPOSITIONS CONTAINING 2-CHLORO-1,1,1,2-TETRAFLUOROPROPANE (HCFC-244BB) Honeywell International Inc. (US) 2020-11-18 EP claimed
CN-111699167-A Compositions comprising 2-chloro-1, 1,1, 2-tetrafluoropropane (HCFC-244bb) 霍尼韦尔国际公司 2020-09-22 CN claimed
EP-1511833-A2 CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS Kyzen Corporation (US) 2005-03-09 EP claimed
US-20040261815-A1 Three-step chamber cleaning process for deposition tools TEXAS INSTRUMENTS, INCORPORATED 2004-12-30 US claimed
US-6699829-B2 ALSO CONTAINING ADDITIVE SELECTED FROM HIGHLY FLUORINATED COMPOUND AND ENHANCEMENT AGENT OR MIXTURES KYZEN CORPORATION 2004-03-02 US claimed
WO-2003104365-A2 CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS KYZEN CORPORATION (US) 2003-12-18 WO claimed
US-20030228997-A1 CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS KYZEN CORPORATION 2003-12-11 US claimed
US-20030083220-A1 Low ozone depleting brominated compound mixtures for use in solvent and cleaning applications KYZEN CORPORATION 2003-05-01 US claimed
EP-1019577-A2 SURFACTANTS FOR USE IN DRYING AND DRY CLEANING COMPOSITIONS AlliedSignal Inc. (US) 2000-07-19 EP claimed
US-5856286-A HYDROPERFLUOROALKYLPYRIDINIUM PHOSPHATES ALLIEDSIGNAL INC. (US) 1999-01-05 US claimed
WO-1998059105-A2 SURFACTANTS FOR USE IN DRYING AND DRY CLEANING COMPOSITIONS ALLIEDSIGNAL INC. (US) 1998-12-30 WO claimed
US-4490209-A SILICON INTEGRATED CIRCUIT TEXAS INSTRUMENTS INCORPORATED (US) 1984-12-25 US claimed