Glutarate

Glutarate

SCHEMBL29217352

COC.O=C(O)CCCC(=O)O

nearest known ligand 0.73

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC22A6 Q4U2R8 2/20 0.73
TSHR P16473 6/20 0.70
LMNA P02545 2/20 0.62
ALDH1A1 P00352 3/20 0.59
NFKB1 P19838 1/20 0.59
PMP22 Q01453 1/20 0.59
AKR1B1 P15121 1/20 0.55
CAMK2A Q9UQM7 1/20 0.53
GPR84 Q9NQS5 7/20 0.52
PPARG P37231 6/20 0.52
PPARD Q03181 6/20 0.52
PPARA Q07869 6/20 0.52
HDAC11 Q96DB2 5/20 0.52
TLR2 O60603 2/20 0.52
TDP1 Q9NUW8 2/20 0.52
FABP4 P15090 2/20 0.52
PTPN1 P18031 2/20 0.52
SLC22A8 Q8TCC7 1/20 0.52
MEN1 O00255 1/20 0.52
ESR1 P03372 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Adipic Acid SCHEMBL12980634 0.93 LMNA (0.73) SLC22A6TSHRLMNAALDH1A1NFKB1
Adipic Acid SCHEMBL2913225 0.88 LMNA (0.65) SLC22A6TSHRLMNAALDH1A1NFKB1
Succinic Acid SCHEMBL2804358 0.86 EGLN1 (0.69) SLC22A6TSHRLMNAALDH1A1NFKB1
Glutarate SCHEMBL27556904 0.86 SLC22A6 (0.85) SLC22A6TSHRLMNAALDH1A1NFKB1
Glutarate SCHEMBL27601182 0.86 SLC22A6 (1.00) SLC22A6TSHRLMNAALDH1A1NFKB1
Glutarate SCHEMBL7414 0.86
Glutarate SCHEMBL6701735 0.86
Glutarate SCHEMBL158774 0.86 SLC22A6 (1.00) SLC22A6TSHRLMNAALDH1A1NFKB1
Adipic Acid SCHEMBL11838813 0.85 LMNA (0.61) SLC22A6TSHRLMNAALDH1A1NFKB1
Valeric Acid SCHEMBL183187 0.85 AKR1B1 (0.70) SLC22A6TSHRLMNAALDH1A1AKR1B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114262424-B Preparation method of epoxy solder resist acrylic oligomer with high sensitivity and photoresist or ink composition 广州斯达利电子原料有限公司 2024-05-24 CN claimed
CN-117887303-A Preparation method of epoxy solder resist acrylic oligomer with high sensitivity and photoresist or ink composition 广州斯达利电子原料有限公司 2024-04-16 CN claimed
CN-114262424-B Preparation method of epoxy solder resist acrylic oligomer with high sensitivity and photoresist or ink composition 广州斯达利电子原料有限公司 2024-05-24 CN disclosed
CN-117887303-A Preparation method of epoxy solder resist acrylic oligomer with high sensitivity and photoresist or ink composition 广州斯达利电子原料有限公司 2024-04-16 CN disclosed