SCHEMBL2923822

SCHEMBL2923822

[CH2]Cc1ccc(OCCCCCCC)cc1

nearest known ligand 0.61

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
NR5A1 Q13285 1/20 0.61
NPC1 O15118 2/20 0.55
RAB9A P51151 2/20 0.55
LTA4H P09960 3/20 0.55
TP53 P04637 2/20 0.54
TSHR P16473 1/20 0.54
HPGD P15428 1/20 0.54
PLA2G4B P0C869 2/20 0.53
MEN1 O00255 1/20 0.51
USP2 O75604 1/20 0.51
ALDH1A1 P00352 1/20 0.51
LMNA P02545 1/20 0.51
CYP3A4 P08684 1/20 0.51
MAPK1 P28482 1/20 0.51
CASP1 P29466 1/20 0.51
KMT2A Q03164 1/20 0.51
SMN1; SMN2 Q16637 1/20 0.51
SLCO1B3 Q9NPD5 1/20 0.51
SLCO1B1 Q9Y6L6 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10568354 1.00 NR5A1 (0.61) NR5A1NPC1RAB9ALTA4HTP53
SCHEMBL11864805 1.00 NR5A1 (0.61) NR5A1NPC1RAB9ALTA4HTP53
SCHEMBL677822 1.00 NR5A1 (0.61) NR5A1NPC1RAB9ALTA4HTP53
SCHEMBL676996 1.00 NR5A1 (0.61) NR5A1NPC1RAB9ALTA4HTP53
SCHEMBL677003 0.98 NR5A1 (0.58) NR5A1NPC1RAB9ALTA4HTP53
SCHEMBL2404852 0.94 LTA4H (0.53) NR5A1LTA4HTSHRCYP3A4SMN1; SMN2
SCHEMBL3195193 0.86 L3MBTL1 (0.53) NPC1RAB9ALTA4HHPGDMEN1
Ethylene SCHEMBL28261436 0.86 NR5A1 (0.73) NR5A1NPC1RAB9ALTA4HTP53
SCHEMBL10943900 0.85 NR5A1 (0.79) NR5A1NPC1RAB9ALTA4HTP53
SCHEMBL11095674 0.85 NR5A1 (0.79) NR5A1NPC1RAB9ALTA4HTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1467251-B1 Positive resist composition FUJIFILM CORP (JP) 2010-09-08 EP disclosed
US-20080096130-A1 POSITIVE RESIST COMPOSITION FUJIFILM CORPORATION 2008-04-24 US disclosed
US-7361446-B2 Sensitivity, high resolution, good pattern profile, used for super-microlithography FUJIFILM CORPORATION (JP) 2008-04-22 US disclosed
EP-1467251-A1 Positive resist composition Fuji Photo Film Co., Ltd. (JP) 2004-10-13 EP disclosed
US-20040197702-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2004-10-07 US disclosed
US-6727033-B2 A POSITIVE RESIST COMPOSITION COMPRISING A RESIN (A), WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPING SOLUTION, CONTAINING A STRUCTURAL UNIT INCLUDING A GROUP REPRESENTED BY FORMULA (X) DEFINED IN FUJI PHOTO FILM CO., LTD. (JP) 2004-04-27 US disclosed
US-20030134221-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2003-07-17 US disclosed