SCHEMBL2925754

SCHEMBL2925754

C=CCc1c(O)ccc(C(=O)O)c1O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SELL P14151 1/20 0.52
SELP P16109 1/20 0.52
MEN1 O00255 3/20 0.44
KMT2A Q03164 3/20 0.44
MAPT P10636 2/20 0.44
HPGD P15428 2/20 0.44
HTT P42858 2/20 0.44
LMNA P02545 1/20 0.44
SRD5A1 P18405 1/20 0.44
PTPN1 P18031 4/20 0.40
DHODH Q02127 1/20 0.40
XDH P47989 1/20 0.39
KDM4E B2RXH2 2/20 0.38
GAA P10253 2/20 0.38
TSHR P16473 2/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
HSD17B10 Q99714 1/20 0.38
GABRA1 P14867 2/20 0.38
GABRB2 P47870 2/20 0.38
ALDH1A1 P00352 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL788899 0.89 SELL (0.45) SELLSELPMEN1KMT2AMAPT
SCHEMBL10693944 0.87 SRD5A1 (0.45) SELLSELPMEN1KMT2AMAPT
SCHEMBL6526829 0.86 SELL (0.52) SELLSELPMEN1KMT2AMAPT
SCHEMBL9747339 0.84 SRD5A1 (0.43) SELLSELPMEN1KMT2AMAPT
SCHEMBL299374 0.84 SELL (0.41) SELLSELPKDM4EGAATSHR
SCHEMBL8772614 0.84 SLC22A6 (0.44) SELLSELPMEN1KMT2AMAPT
SCHEMBL8957163 0.84 SRD5A1 (0.43) MEN1KMT2AMAPTHPGDHTT
SCHEMBL31657717 0.84 ALDH1A1 (0.48) MEN1KMT2AMAPTHPGDHTT
SCHEMBL9303754 0.84 ALDH1A1 (0.48) MEN1KMT2AMAPTHPGDHTT
SCHEMBL7676286 0.83 KDM4E (0.44) SELLSELPMEN1KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7671001-B2 Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors MALLINCKRODT BAKER, INC. (US) 2010-03-02 US disclosed
US-20070060490-A1 Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors AVANTOR PERFORMANCE MATERIALS, INC. 2007-03-15 US disclosed
EP-1692572-A2 ALKALINE, POST PLASMA ETCH/ASH RESIDUE REMOVERS AND PHOTORESIST STRIPPING COMPOSITIONS CONTAINING METAL-HALIDE CORROSION INHIBITORS Mallinckrodt Baker, Inc. (US) 2006-08-23 EP disclosed
WO-2005043245-A2 ALKALINE, POST PLASMA ETCH/ASH RESIDUE REMOVERS AND PHOTORESIST STRIPPING COMPOSITIONS CONTAINING METAL-HALIDE CORROSION INHIBITORS MALLINCKRODT BAKER INC. (US) 2005-05-12 WO disclosed
EP-0028063-B1 PHENOL DERIVATIVES, PROCESSES FOR THEIR PREPARATION AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM GLAXO GROUP LIMITED (GB) 1984-06-13 EP disclosed