Malonic Acid

Malonic Acid

SCHEMBL29264757

O=C(O)CC(=O)O.O=C(c1ccccc1)N(Cc1ccccc1)Cc1ccccc1

nearest known ligand 0.68

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC1 Q13547 3/20 0.68
HDAC6 Q9UBN7 3/20 0.68
HDAC3 O15379 1/20 0.68
HDAC7 Q8WUI4 1/20 0.68
HDAC10 Q969S8 1/20 0.68
HDAC8 Q9BY41 1/20 0.68
KMT2A Q03164 3/20 0.62
MEN1 O00255 2/20 0.62
L3MBTL1 Q9Y468 1/20 0.59
CRHBP P24387 1/20 0.58
CRHR2 Q13324 1/20 0.58
TSHR P16473 1/20 0.56
CTSL P07711 1/20 0.55
CTSS P25774 1/20 0.55
TDP1 Q9NUW8 1/20 0.54
KDM4E B2RXH2 1/20 0.54
ALDH1A1 P00352 2/20 0.53
NPSR1 Q6W5P4 1/20 0.53
CFTR P13569 1/20 0.53
HSD11B1 P28845 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Malonic Acid SCHEMBL29264759 1.00 HDAC1 (0.68) HDAC1HDAC6HDAC3HDAC7HDAC10
SCHEMBL1003508 0.92 HDAC1 (0.71) HDAC1HDAC6HDAC3HDAC7HDAC10
Oxalic Acid SCHEMBL29264737 0.88 HDAC1 (0.67) HDAC1HDAC6HDAC3HDAC7HDAC10
Oxalic Acid SCHEMBL29264739 0.88 HDAC1 (0.67) HDAC1HDAC6HDAC3HDAC7HDAC10
SCHEMBL8359492 0.88 KMT2A (0.76) HDAC1HDAC6HDAC3HDAC7HDAC10
SCHEMBL5190596 0.85 CTSS (0.59) HDAC1HDAC6HDAC3HDAC7HDAC10
SCHEMBL10724882 0.85 KMT2A (0.73) HDAC1HDAC6HDAC3HDAC7HDAC10
SCHEMBL6843722 0.85 ALDH1A1 (0.68) HDAC1HDAC6HDAC3HDAC7HDAC10
Maleic Acid SCHEMBL29264745 0.83 HDAC3 (0.61) HDAC1HDAC6HDAC3HDAC7HDAC10
Maleic Acid SCHEMBL29264746 0.83 HDAC3 (0.61) HDAC1HDAC6HDAC3HDAC7HDAC10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114660896-B Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound 信越化学工业株式会社 2024-06-11 CN disclosed