⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1507473 | 0.88 | — | — | |
| SCHEMBL29101470 | 0.84 | — | — | |
| SCHEMBL18217367 | 0.74 | — | — | |
| SCHEMBL8994245 | 0.74 | — | — | |
| SCHEMBL23616086 | 0.71 | — | — | |
| SCHEMBL14249132 | 0.71 | ALDH1A1 (0.31) | — | |
| SCHEMBL8526598 | 0.71 | ODC1 (0.30) | — | |
| SCHEMBL2788411 | 0.70 | CA2 (0.34) | — | |
| SCHEMBL14273905 | 0.70 | — | — | |
| SCHEMBL2417794 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 122 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114163564-B | Film-forming resin containing cholic acid-butenoate derivative and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2023-02-28 | — | — | CN | claimed |
| CN-114163564-A | Film-forming resin containing cholic acid-butenoate derivative and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2022-03-11 | — | — | CN | claimed |
| CN-113999340-A | Film-forming resin containing silicon or sulfur and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2022-02-01 | — | — | CN | claimed |
| CN-111123649-A | Negative photoresist composition containing high-heat-resistance carboxyl phenolic resin | 苏州瑞红电子化学品有限公司 | 2020-05-08 | — | — | CN | claimed |
| CN-115974880-A | Crosslinking agent, preparation method thereof and photoresist | 上海彤程电子材料有限公司 | 2023-04-18 | — | — | CN | disclosed |
| CN-115947648-A | Crosslinking agent, preparation method thereof and photoresist | 北京彤程创展科技有限公司 | 2023-04-11 | — | — | CN | disclosed |
| CN-115925645-A | Crosslinking agent, preparation method thereof and photoresist | 上海彤程电子材料有限公司 | 2023-04-07 | — | — | CN | disclosed |
| CN-114163564-B | Film-forming resin containing cholic acid-butenoate derivative and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2023-02-28 | — | — | CN | disclosed |
| CN-114163564-A | Film-forming resin containing cholic acid-butenoate derivative and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2022-03-11 | — | — | CN | disclosed |
| CN-113999340-A | Film-forming resin containing silicon or sulfur and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2022-02-01 | — | — | CN | disclosed |
| CN-113717314-A | Photosensitive film-forming resin, photoresist composition and preparation method thereof | 江苏集萃光敏电子材料研究所有限公司 | 2021-11-30 | — | — | CN | disclosed |
| CN-111123649-A | Negative photoresist composition containing high-heat-resistance carboxyl phenolic resin | 苏州瑞红电子化学品有限公司 | 2020-05-08 | — | — | CN | disclosed |
| EP-1096318-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-05-02 | — | — | EP | disclosed |
| EP-1096317-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-05-02 | — | — | EP | disclosed |
| EP-1085377-A1 | Resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-03-21 | — | — | EP | disclosed |
| EP-1053985-A1 | Resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2000-11-22 | — | — | EP | disclosed |
| EP-1053986-A1 | Resist materials and compounds therefore | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-11-22 | — | — | EP | disclosed |
| US-6147249-A | ESTER COMPOUND CAPABLE OF FORMING ACID-DECOMPOSABLE POLYMER WHICH CAN BE BLENDED AS BASE RESIN TO FORMULATE RESIST COMPOSITION HAVING HIGHER SENSITIVITY, RESOLUTION AND ETCHING RESISTANCE THAN CONVENTIONAL RESIST COMPOSITIONS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-11-14 | — | — | US | disclosed |
| EP-1031879-A1 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-08-30 | — | — | EP | disclosed |
| EP-1004568-A2 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-05-31 | — | — | EP | disclosed |