SCHEMBL29319695

SCHEMBL29319695

CC(F)(F)C(C)(F)C(F)(F)S(=O)(=O)NC(=O)c1ccc(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)O)c(I)c1

nearest known ligand 0.31

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
HDAC1 Q13547 1/20 0.30
HDAC8 Q9BY41 1/20 0.30
HDAC6 Q9UBN7 1/20 0.30
SCN9A Q15858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25519622 0.93 HDAC1 (0.31) HDAC1HDAC8HDAC6SCN9A
SCHEMBL29319689 0.84 CXCR2 (0.34)
SCHEMBL25699334 0.82 HDAC1 (0.33) HDAC1HDAC8HDAC6SCN9A
SCHEMBL25467900 0.82 STS (0.36) HDAC1HDAC8HDAC6SCN9A
SCHEMBL25467902 0.77 ELANE (0.31)
SCHEMBL25467901 0.76 CXCR2 (0.34)
SCHEMBL23808361 0.74 ENPP1 (0.36)
SCHEMBL25918164 0.72
SCHEMBL25881636 0.70 SMN1; SMN2 (0.33) HDAC1
SCHEMBL26445899 0.70 CXCR2 (0.38) SCN9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240241444-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-07-18 US disclosed