SCHEMBL26445899

SCHEMBL26445899

CS(=O)(=O)NS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)NC(=O)c1ccc(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)O)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CXCR2 P25025 2/20 0.38
PTPN1 P18031 1/20 0.37
SCN9A Q15858 4/20 0.33
SCN5A Q14524 3/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
GAA P10253 1/20 0.33
MAPT P10636 1/20 0.33
MAPK1 P28482 1/20 0.33
HTT P42858 1/20 0.33
ENPP3 O14638 3/20 0.32
ENPP1 P22413 3/20 0.32
ENPP2 Q13822 1/20 0.32
SCN3A Q9NY46 1/20 0.32
STS P08842 2/20 0.32
EPHX2 P34913 1/20 0.31
NR1H4 Q96RI1 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23808361 0.92 ENPP1 (0.36) CXCR2PTPN1MEN1KMT2ASMN1; SMN2
SCHEMBL26452260 0.90 CXCR2 (0.34) CXCR2PTPN1SCN9ASCN5AMEN1
SCHEMBL25467901 0.88 CXCR2 (0.34) CXCR2PTPN1MEN1KMT2ASMN1; SMN2
SCHEMBL25467937 0.86 STS (0.35) CXCR2PTPN1MEN1KMT2ASMN1; SMN2
SCHEMBL29319689 0.85 CXCR2 (0.34) CXCR2PTPN1MEN1KMT2ASMN1; SMN2
SCHEMBL26452047 0.84 CXCR2 (0.36) CXCR2PTPN1SCN9ASCN5AMEN1
SCHEMBL25881636 0.84 SMN1; SMN2 (0.33) CXCR2PTPN1MEN1KMT2ASMN1; SMN2
SCHEMBL26445970 0.83 ALOX15 (0.35) CXCR2PTPN1MEN1KMT2ASMN1; SMN2
SCHEMBL26452783 0.82 SCN5A (0.39) PTPN1SCN9ASCN5AMEN1KMT2A
SCHEMBL24909132 0.82 PTPN1 (0.33) CXCR2PTPN1MEN1KMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230139891-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND FUJIFILM CORPORATION (JP) 2023-05-04 US disclosed