SCHEMBL29319689

SCHEMBL29319689

CC(F)(F)C(C)(F)C(F)(F)S(=O)(=O)NC(=O)c1ccc(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)O)cc1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CXCR2 P25025 1/20 0.34
MEN1 O00255 3/20 0.34
KMT2A Q03164 3/20 0.34
SMN1; SMN2 Q16637 3/20 0.34
MAPT P10636 2/20 0.34
MAPK1 P28482 2/20 0.34
GAA P10253 1/20 0.34
HTT P42858 1/20 0.34
EGFR P00533 2/20 0.33
ENPP1 P22413 4/20 0.33
ENPP3 O14638 3/20 0.33
TRPV1 Q8NER1 2/20 0.33
ENPP2 Q13822 1/20 0.33
PTPN1 P18031 1/20 0.33
STS P08842 2/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
LMNA P02545 1/20 0.31
RAB9A P51151 2/20 0.31
NPC1 O15118 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25467901 0.92 CXCR2 (0.34) CXCR2MEN1KMT2ASMN1; SMN2MAPT
SCHEMBL23808361 0.90 ENPP1 (0.36) CXCR2MEN1KMT2ASMN1; SMN2MAPT
SCHEMBL25881636 0.85 SMN1; SMN2 (0.33) CXCR2MEN1KMT2ASMN1; SMN2MAPT
SCHEMBL26445899 0.85 CXCR2 (0.38) CXCR2MEN1KMT2ASMN1; SMN2MAPT
SCHEMBL25467937 0.85 STS (0.35) CXCR2MEN1KMT2ASMN1; SMN2MAPT
SCHEMBL29319695 0.84 HDAC1 (0.30)
SCHEMBL26445970 0.84 ALOX15 (0.35) CXCR2MEN1KMT2ASMN1; SMN2MAPT
SCHEMBL26452260 0.84 CXCR2 (0.34) CXCR2MEN1KMT2ASMN1; SMN2MAPT
SCHEMBL24909132 0.83 PTPN1 (0.33) CXCR2MEN1KMT2ASMN1; SMN2MAPT
SCHEMBL25468209 0.83 CXCR2 (0.36) CXCR2MEN1KMT2ASMN1; SMN2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240241444-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-07-18 US disclosed