SCHEMBL29319784

SCHEMBL29319784

COCCCCOCCCOC(=O)c1ccccc1

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.71
LMNA P02545 1/20 0.57
TSHR P16473 4/20 0.50
SCN1A P35498 1/20 0.48
SCN2A Q99250 1/20 0.48
SCN3A Q9NY46 1/20 0.48
CYP3A4 P08684 2/20 0.47
ABCB11 O95342 1/20 0.47
ADRA2B P18089 1/20 0.47
OPRD1 P41143 1/20 0.47
SCN5A Q14524 1/20 0.47
POLB P06746 1/20 0.47
MAPK1 P28482 2/20 0.46
TP53 P04637 1/20 0.46
HIF1A Q16665 1/20 0.46
SLC6A2 P23975 1/20 0.46
SLC6A3 Q01959 1/20 0.46
KMT2A Q03164 1/20 0.46
CNR2 P34972 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9952023 0.93 TDP1 (0.75) TDP1LMNATSHRSCN1ASCN2A
SCHEMBL758741 0.93 TDP1 (0.81) TDP1LMNATSHRCYP3A4POLB
SCHEMBL13881856 0.92 TDP1 (0.79) TDP1LMNATSHRCYP3A4POLB
SCHEMBL1674740 0.90 TDP1 (0.88) TDP1LMNATSHRSCN1ASCN2A
SCHEMBL22832400 0.90 TDP1 (0.81) TDP1LMNATSHRSCN1ASCN2A
SCHEMBL115000 0.90 TDP1 (0.81) TDP1LMNATSHRSCN1ASCN2A
SCHEMBL14677534 0.88 TDP1 (0.78) TDP1LMNASCN1ASCN2ASCN3A
Formic Acid SCHEMBL28314231 0.87 TDP1 (0.66) TDP1LMNATSHRSCN1ASCN2A
Phosphoric Acid SCHEMBL6464748 0.87 TDP1 (0.70) TDP1LMNATSHRSCN1ASCN2A
SCHEMBL21733187 0.86 TDP1 (0.75) TDP1LMNASCN1ASCN2ASCN3A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4400914-A2 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-17 EP disclosed