SCHEMBL29323838

SCHEMBL29323838

C=Cc1ccc(S(=O)(=O)CC2CCCCC2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.46
ALDH1A1 P00352 2/20 0.37
KMT2A Q03164 1/20 0.36
CA2 P00918 1/20 0.35
MAOA P21397 2/20 0.35
MAOB P27338 2/20 0.35
AOC2 O75106 1/20 0.35
HCRTR1 O43613 1/20 0.35
HCRTR2 O43614 1/20 0.35
GAA P10253 1/20 0.35
MAPT P10636 1/20 0.35
CTDSP1 Q9GZU7 1/20 0.34
HDAC3 O15379 1/20 0.34
HDAC1 Q13547 1/20 0.34
HDAC2 Q92769 1/20 0.34
AKT1 P31749 1/20 0.34
PIK3CA P42336 1/20 0.34
KDM4E B2RXH2 1/20 0.33
RECQL P46063 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21929283 0.91 TDP1 (0.50) TDP1ALDH1A1CA2MAOAMAOB
SCHEMBL29323841 0.84 KCNH2 (0.44) TDP1ALDH1A1MAOAMAOBAOC2
SCHEMBL10228581 0.77 ALDH1A1 (0.53) ALDH1A1KMT2AGAAMAPTSMN1; SMN2
SCHEMBL4819794 0.77 CRBN (0.51) ALDH1A1KMT2AGAAMAPTSMN1; SMN2
SCHEMBL15226077 0.77 ALDH1A1 (0.56) ALDH1A1KMT2AGAAMAPTKDM4E
SCHEMBL19392557 0.76 KCNH2 (0.51) ALDH1A1KMT2ACA2MAOAMAOB
SCHEMBL22289434 0.75 PLCG1 (0.55) ALDH1A1KMT2ACA2GAAMAPT
SCHEMBL6825585 0.75 CRBN (0.53) ALDH1A1KMT2AGAAMAPTSMN1; SMN2
SCHEMBL21820745 0.75 CRBN (0.53) ALDH1A1KMT2AGAAMAPTSMN1; SMN2
SCHEMBL507371 0.75 KCNH2 (0.39) ALDH1A1KMT2ACA2GAAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed