SCHEMBL29330984

SCHEMBL29330984

C=Cc1ccc(OC(=O)c2ccccc2C(=O)O)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HPGD P15428 3/20 0.49
▸ HSD17B10 Q99714 3/20 0.49
▸ ALOX15 P16050 2/20 0.49
▸ MAPT P10636 5/20 0.46
▸ KDM4E B2RXH2 5/20 0.46
▸ TDP1 Q9NUW8 1/20 0.46
▸ ALDH1A1 P00352 5/20 0.45
▸ KMT2A Q03164 5/20 0.45
▸ RAB9A P51151 2/20 0.45
▸ MEN1 O00255 3/20 0.43
▸ NPC1 O15118 1/20 0.43
▸ POLB P06746 1/20 0.43
▸ MAPK1 P28482 1/20 0.43
▸ CASP3 P42574 1/20 0.43
▸ SENP8 Q96LD8 1/20 0.43
▸ SENP7 Q9BQF6 1/20 0.43
▸ SENP6 Q9GZR1 1/20 0.43
▸ CTDSP1 Q9GZU7 1/20 0.41
▸ CYP3A4 P08684 1/20 0.41
▸ TSHR P16473 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10783424 0.86 HSD17B10 (0.62) HPGDHSD17B10ALOX15MAPTKDM4E
SCHEMBL29331006 0.86 ALDH1A1 (0.52) HPGDHSD17B10ALOX15MAPTKDM4E
SCHEMBL9472028 0.84 HPGD (0.67) HPGDHSD17B10ALOX15MAPTKDM4E
SCHEMBL9861237 0.83 ALDH1A1 (0.57) HPGDHSD17B10ALOX15MAPTKDM4E
Phthalic Acid SCHEMBL9391164 0.82 HSD17B10 (0.68) HPGDHSD17B10ALOX15MAPTKDM4E
SCHEMBL251479 0.82 HSD17B10 (0.68) HPGDHSD17B10ALOX15MAPTKDM4E
SCHEMBL30778294 0.82 HSD17B10 (0.68) HPGDHSD17B10ALOX15MAPTKDM4E
SCHEMBL1143616 0.81 KMT2A (0.66) HPGDMAPTKDM4ETDP1ALDH1A1
SCHEMBL27674260 0.81 HSD17B10 (0.66) HPGDHSD17B10ALOX15MAPTKDM4E
SCHEMBL28014349 0.81 HSD17B10 (0.66) HPGDHSD17B10ALOX15MAPTKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240242967-A1 Polymer For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-18 — — US disclosed
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