SCHEMBL29352001

SCHEMBL29352001

ClC(Cl)(Cl)c1nc(-c2ccc3c(c2)OCO3)nc(C(Cl)(Cl)Cl)n1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADORA2A P29274 5/20 0.47
ADORA1 P30542 4/20 0.47
MEN1 O00255 5/20 0.46
KMT2A Q03164 5/20 0.46
HSD17B10 Q99714 5/20 0.46
LMNA P02545 5/20 0.46
CYP1A2 P05177 4/20 0.46
CYP3A4 P08684 4/20 0.46
CYP2D6 P10635 4/20 0.46
CYP2C19 P33261 4/20 0.46
USP2 O75604 3/20 0.46
ALOX15 P16050 3/20 0.46
CLK4 Q9HAZ1 3/20 0.46
MAPK1 P28482 3/20 0.46
ADORA3 P0DMS8 3/20 0.46
TSHR P16473 2/20 0.46
CYP2C9 P11712 1/20 0.46
SMN1; SMN2 Q16637 5/20 0.46
NPC1 O15118 4/20 0.46
RAB9A P51151 4/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL391704 1.00 ADORA2A (0.47) ADORA2AADORA1MEN1KMT2AHSD17B10
SCHEMBL9908126 0.90 ALDH1A1 (0.48) ADORA2AADORA1MEN1KMT2AHSD17B10
SCHEMBL5187633 0.85 SMN1; SMN2 (0.47) MEN1KMT2AHSD17B10LMNACYP1A2
SCHEMBL14622040 0.84 MEN1 (0.40) ADORA2AADORA1MEN1KMT2AHSD17B10
SCHEMBL21933178 0.84 ADORA2A (0.36) ADORA2AADORA1MEN1KMT2AHSD17B10
SCHEMBL29506845 0.81 AHR (0.36) NPC1RAB9A
SCHEMBL81529 0.81 AHR (0.36) NPC1RAB9A
SCHEMBL3425698 0.79
SCHEMBL17447741 0.79 MAPT (0.42) MEN1KMT2AHSD17B10LMNACYP1A2
SCHEMBL17447740 0.79 MAPT (0.42) MEN1KMT2AHSD17B10LMNACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 132 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-121873631-B Spin-on carbon composition, semiconductor preparation method and semiconductor device Jiageng Innovation Laboratory (CN) 2026-05-26 CN claimed
CN-122011922-A Bottom anti-reflection coating composition and preparation and application thereof 嘉庚创新实验室 2026-05-12 CN claimed
CN-113671793-B Chemical amplification type positive ultraviolet photoresist and preparation and use methods thereof 徐州博康信息化学品有限公司 2024-12-31 CN claimed
CN-119156104-A Preparation method of photoelectric device, photoelectric device and display device 广东聚华新型显示研究院 2024-12-17 CN claimed
CN-115368494-B Monomer copolymer containing hexafluoroisopropanol, preparation method thereof, chemical amplification type photoresist and application thereof 瑞红(苏州)电子化学品股份有限公司 2024-03-29 CN claimed
CN-114089601-A Chemical amplification type negative UV photoresist, preparation method and use method thereof 江苏汉拓光学材料有限公司 2022-02-25 CN claimed
CN-121873631-B Spin-on carbon composition, semiconductor preparation method and semiconductor device Jiageng Innovation Laboratory (CN) 2026-05-26 CN disclosed
CN-116323748-B Ultraviolet curable composition and use thereof 陶氏东丽株式会社 2026-05-12 CN disclosed
CN-122011922-A Bottom anti-reflection coating composition and preparation and application thereof 嘉庚创新实验室 2026-05-12 CN disclosed
US-20250352110-A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR PRODUCING BIO-ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-11-20 US disclosed
US-12465653-B2 Thienoazepine immunoconjugates, and uses thereof BOLT BIOTHERAPEUTICS, INC. (US) 2025-11-11 US disclosed
US-20250271751-A1 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM, LOWER LAYER FILM, METHOD FOR PRODUCING STRUCTURE HAVING PHASE-SEPARATED STRUCTURE, AND COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2025-08-28 US disclosed
CN-120065622-A Photosensitive resin composition and method for producing microlens 东京应化工业株式会社 2025-05-30 CN disclosed
CN-110267992-B Curable composition, cured film, near-infrared cut filter, solid-state imaging element, image display device, and infrared sensor 富士胶片株式会社 2022-04-05 CN disclosed
CN-114245881-A Photosensitive resin composition 日产化学株式会社 2022-03-25 CN disclosed
CN-114207524-A Resin composition, dry film, resist film, compound, acid generator, and method for producing N-organic sulfonyloxy compound 东京应化工业株式会社 2022-03-18 CN disclosed
CN-111212722-B Rubber composition for three-dimensional laminate molding 住友橡胶工业株式会社 2022-03-15 CN disclosed
CN-114153122-A Cationic free radical polymerization composition for preparing LDI dry film and LDI dry film 保定乐凯新材料股份有限公司 2022-03-08 CN disclosed
CN-114089601-A Chemical amplification type negative UV photoresist, preparation method and use method thereof 江苏汉拓光学材料有限公司 2022-02-25 CN disclosed
CN-113956395-A Polymer resin and preparation method thereof, electron beam photoresist and preparation and use methods thereof 江苏汉拓光学材料有限公司 2022-01-21 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12465653-B2 Thienoazepine immunoconjugates, and uses thereof ICOS, CYP3A5, TPH1 ADORA2A 1974/4885ADORA1 1475/4885MEN1 1637/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.