SCHEMBL29356358

SCHEMBL29356358

CCC(C)OCC(O)COc1ccc(-c2nc(-c3ccc(OCC(O)COC(C)CC)cc3O)nc(-c3ccc(OCC(O)COC(C)CC)cc3O)n2)c(O)c1

nearest known ligand 0.44

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 3/20 0.44
ADRB1 P08588 2/20 0.44
NPC1 O15118 1/20 0.39
MAPT P10636 2/20 0.38
LMNA P02545 1/20 0.38
POLB P06746 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
PTGS1 P23219 1/20 0.38
SLC6A2 P23975 1/20 0.38
HIF1A Q16665 1/20 0.36
ADRB3 P13945 2/20 0.36
KMT2A Q03164 2/20 0.35
CRHR1 P34998 1/20 0.35
MEN1 O00255 1/20 0.35
PLA2G4B P0C869 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
ABCB1 P08183 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL787012 1.00 ADRB2 (0.44) ADRB2ADRB1NPC1MAPTLMNA
SCHEMBL14370143 0.94 ADRB2 (0.40) ADRB2ADRB1NPC1MAPTLMNA
SCHEMBL29386904 0.89 ADRB2 (0.41) ADRB2ADRB1MAPTLMNAPOLB
SCHEMBL769388 0.87 MAPT (0.38) ADRB2ADRB1MAPTLMNAPOLB
SCHEMBL29353912 0.87 MAPT (0.38) ADRB2ADRB1MAPTLMNAPOLB
SCHEMBL12755354 0.86 ADRB2 (0.47) ADRB2ADRB1NPC1MAPTLMNA
SCHEMBL6450928 0.83 PLA2G4B (0.40) ADRB2ADRB1MAPTLMNAPLA2G4B
SCHEMBL13030453 0.82 NPC1 (0.47) ADRB2ADRB1NPC1MAPTLMNA
SCHEMBL7896079 0.81 NR2E1 (0.43) ADRB2ADRB1MAPTLMNAPOLB
SCHEMBL21752509 0.80 ADRB2 (0.40) ADRB2ADRB1MAPTLMNAPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120092045-A Synergistic stabilizer composition and method for protecting organic material from UV rays and thermal degradation using the same 塞特工业公司 2025-06-03 CN claimed
CN-118591450-A Polymer composition with densification promoter and rotational molding method for manufacturing hollow article therefrom 塞特工业公司 2024-09-03 CN claimed
CN-117597403-A Composition and method for protecting a coating from harmful effects of exposure to UV-C light 塞特工业公司 2024-02-23 CN claimed
EP-4251689-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT Cytec Industries, Inc. (US) 2023-10-04 EP claimed
CN-115368629-A Stabilizer composition and method for protecting organic materials from UV light and thermal degradation using the same 塞特工业公司 2022-11-22 CN claimed
WO-2022115573-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT CYTEC INDUSTRIES INC. (US) 2022-06-02 WO claimed
CN-120092045-A Synergistic stabilizer composition and method for protecting organic material from UV rays and thermal degradation using the same 塞特工业公司 2025-06-03 CN disclosed
WO-2025056330-A1 STABILIZED POLYMER COMPOSITIONS WITH IMPROVED COLOR RESISTANCE CYTEC INDUSTRIES INC. (US) 2025-03-20 WO disclosed
EP-4457069-A1 POLYMER COMPOSITIONS HAVING DENSIFICATION ACCELERATORS AND ROTATIONAL MOLDING PROCESSES FOR MAKING HOLLOW ARTICLES THEREFROM Cytec Industries Inc. (US) 2024-11-06 EP disclosed
CN-118591450-A Polymer composition with densification promoter and rotational molding method for manufacturing hollow article therefrom 塞特工业公司 2024-09-03 CN disclosed
EP-4363506-A1 COMPOSITIONS AND METHODS FOR PROTECTING COATINGS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT Cytec Industries Inc. (US) 2024-05-08 EP disclosed
CN-117597403-A Composition and method for protecting a coating from harmful effects of exposure to UV-C light 塞特工业公司 2024-02-23 CN disclosed
EP-4251689-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT Cytec Industries, Inc. (US) 2023-10-04 EP disclosed
CN-115368629-A Stabilizer composition and method for protecting organic materials from UV light and thermal degradation using the same 塞特工业公司 2022-11-22 CN disclosed
US-20220259405-A1 Stabilized Polyolefin Compositions Comprising Benzofuranones and Hindered Amine Light Stabilizers BASF CORPORATION 2022-08-18 US disclosed
CN-110352223-B Coating composition with covalently bound UV absorber 巴斯夫欧洲公司 2022-08-02 CN disclosed
WO-2022115573-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT CYTEC INDUSTRIES INC. (US) 2022-06-02 WO disclosed
EP-4004099-A1 STABILIZER COMPOSITION BASF SE (DE) 2022-06-01 EP disclosed
CN-114144464-A Stabilizer composition 巴斯夫欧洲公司 2022-03-04 CN disclosed
EP-3941970-A1 UV CURABLE COMPOSITIONS FOR DIRT PICK-UP RESISTANCE BASF SE (DE) 2022-01-26 EP disclosed