SCHEMBL29366244

SCHEMBL29366244

CCCOc1c2ccccc2c(OCCC)c2cc(C(C)(C)C)ccc12

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 3/20 0.42
PGR P06401 1/20 0.42
RORA P35398 1/20 0.42
RORC P51449 1/20 0.42
RORB Q92753 1/20 0.42
MAPT P10636 2/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
KDM4E B2RXH2 2/20 0.36
GABRP O00591 1/20 0.35
GABRD O14764 1/20 0.35
GABRA1 P14867 1/20 0.35
GABRB1 P18505 1/20 0.35
GABRG2 P18507 1/20 0.35
GABRB3 P28472 1/20 0.35
GABRA5 P31644 1/20 0.35
GABRA3 P34903 1/20 0.35
GABRA2 P47869 1/20 0.35
GABRB2 P47870 1/20 0.35
GABRA4 P48169 1/20 0.35
GABRE P78334 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL753576 1.00 KIF11 (0.42) KIF11PGRRORARORCRORB
SCHEMBL28909709 0.94 KIF11 (0.39) KIF11PGRRORARORCRORB
SCHEMBL29690008 0.92 PGR (0.47) KIF11PGRRORARORCRORB
SCHEMBL1470700 0.92 PGR (0.47) KIF11PGRRORARORCRORB
SCHEMBL10016181 0.91 PGR (0.46) KIF11PGRRORARORCRORB
SCHEMBL10046163 0.89 PGR (0.45) KIF11PGRRORARORCRORB
SCHEMBL10016166 0.89 PGR (0.45) KIF11PGRRORARORCRORB
SCHEMBL10016165 0.89 PGR (0.45) KIF11PGRRORARORCRORB
SCHEMBL10016173 0.89 PGR (0.45) KIF11PGRRORARORCRORB
SCHEMBL10016164 0.89 PGR (0.45) KIF11PGRRORARORCRORB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119937243-A Chemically amplified positive photosensitive resin composition, cured film, and element having cured film 奇美实业股份有限公司 2025-05-06 CN disclosed
US-20240076656-A1 HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST 10X GENOMICS, INC. (US) 2024-03-07 US disclosed
EP-4271511-A1 MOLECULAR ARRAY GENERATION USING PHOTORESIST 10X Genomics, Inc. (US) 2023-11-08 EP disclosed
CN-116360211-A Chemically amplified positive photosensitive resin composition, protective film, and element having protective film 奇美实业股份有限公司 2023-06-30 CN disclosed
CN-109799680-B Chemically amplified positive photosensitive resin composition and use thereof 奇美实业股份有限公司 2023-03-10 CN disclosed
CN-113264856-B Sulfonium salt, photoacid generator, and photosensitive composition 东京应化工业株式会社 2022-11-22 CN disclosed
CN-108241257-B Chemically amplified positive photosensitive resin composition, method for producing substrate with mold, and method for producing molded article by plating 奇美实业股份有限公司 2022-11-08 CN disclosed
WO-2022147140-A1 MOLECULAR ARRAY GENERATION USING PHOTORESIST 10X GENOMICS, INC. (US) 2022-07-07 WO disclosed
CN-111690308-B Energy-curable composition and use thereof in the field of energy curing 常州强力先端电子材料有限公司 2022-02-01 CN disclosed