SCHEMBL29366383

SCHEMBL29366383

Cc1cc(CCC(C)(c2cc(C)c(O)cc2C)c2cc(C)c(O)cc2C)c(C)cc1O

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HIF1A Q16665 3/20 0.36
ALOX15 P16050 3/20 0.36
CYP2D6 P10635 3/20 0.36
CYP2C9 P11712 3/20 0.36
CYP2C19 P33261 3/20 0.36
NPSR1 Q6W5P4 2/20 0.36
ALDH1A1 P00352 2/20 0.36
CYP3A4 P08684 2/20 0.36
MAPK1 P28482 2/20 0.36
HSD17B10 Q99714 2/20 0.36
KDM4E B2RXH2 1/20 0.36
CYP1A2 P05177 1/20 0.36
MAPT P10636 1/20 0.36
G6PD P11413 1/20 0.36
PKM P14618 1/20 0.36
HPGD P15428 1/20 0.36
ALOX12 P18054 1/20 0.36
CCR6 P51684 1/20 0.36
ESR1 P03372 5/20 0.33
ESR2 Q92731 3/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16010767 1.00 HIF1A (0.36) HIF1AALOX15CYP2D6CYP2C9CYP2C19
SCHEMBL6264253 0.83 ALOX15 (0.45) HIF1AALOX15CYP2D6CYP2C9CYP2C19
SCHEMBL31670494 0.83 ALOX15 (0.45) HIF1AALOX15CYP2D6CYP2C9CYP2C19
SCHEMBL9797815 0.73 NPSR1 (0.48) HIF1AALOX15CYP2D6CYP2C9CYP2C19
SCHEMBL14139877 0.71 NPSR1 (0.46) HIF1AALOX15CYP2D6CYP2C9CYP2C19
SCHEMBL14755445 0.71 ALDH1A1 (0.46) HIF1AALOX15CYP2D6CYP2C9CYP2C19
SCHEMBL1245497 0.71 ALOX15 (0.52) HIF1AALOX15CYP2D6CYP2C9CYP2C19
SCHEMBL29872696 0.71 ALOX15 (0.52) HIF1AALOX15CYP2D6CYP2C9CYP2C19
SCHEMBL2287328 0.71 ALDH1A1 (0.50) HIF1AALOX15CYP2D6CYP2C9CYP2C19
SCHEMBL2454517 0.70 TAAR1 (0.50) HIF1AALOX15CYP2D6CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11681227-B2 Enhanced EUV photoresist materials, formulations and processes IRRESISTIBLE MATERIALS LTD (GB) 2023-06-20 US disclosed
CN-113994256-A Method for forming EUV patterned resist 亚历克斯·P·G·罗宾逊 2022-01-28 CN disclosed