SCHEMBL29370962

SCHEMBL29370962

Cc1ccc(C(=O)Oc2c3ccccc3c(OC(=O)c3ccc(C)cc3)c3c(C)cccc23)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.50
KMT2A Q03164 3/20 0.50
GAA P10253 2/20 0.50
ESR1 P03372 1/20 0.50
ESR2 Q92731 1/20 0.50
PKM P14618 1/20 0.50
NPSR1 Q6W5P4 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
NOD2 Q9HC29 1/20 0.48
NPC1 O15118 2/20 0.44
RAB9A P51151 2/20 0.44
CYP1A2 P05177 1/20 0.44
CYP2C9 P11712 1/20 0.44
HPGD P15428 1/20 0.44
CYP2C19 P33261 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
TDP1 Q9NUW8 1/20 0.42
S100A4 P26447 1/20 0.42
POLB P06746 3/20 0.40
MAPT P10636 3/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4645178 0.91 MAPT (0.47) ALDH1A1KMT2AGAAESR1ESR2
SCHEMBL29371724 0.91 MAPT (0.47) ALDH1A1KMT2AGAAESR1ESR2
SCHEMBL29372159 0.87 ALDH1A1 (0.60) ALDH1A1KMT2AGAAESR1ESR2
SCHEMBL23152131 0.87 ALDH1A1 (0.60) ALDH1A1KMT2AGAAESR1ESR2
SCHEMBL29368617 0.86 ALDH1A1 (0.48) ALDH1A1KMT2AGAAESR1ESR2
SCHEMBL29368578 0.86 ALDH1A1 (0.48) ALDH1A1KMT2AGAAESR1ESR2
SCHEMBL29368995 0.86 KMT2A (0.48) ALDH1A1KMT2AGAAESR1ESR2
SCHEMBL29371693 0.83 NPC1 (0.44) ALDH1A1KMT2AESR1ESR2PKM
SCHEMBL29371748 0.80 KMT2A (0.53) ALDH1A1KMT2AGAAESR1ESR2
SCHEMBL4647197 0.80 KDM4E (0.57) ALDH1A1KMT2AGAAESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 CN disclosed