SCHEMBL4645178

SCHEMBL4645178

Cc1cccc2c(OC(=O)c3ccccc3)c3ccccc3c(OC(=O)c3ccccc3)c12

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 7/20 0.47
GAA P10253 5/20 0.47
LMNA P02545 4/20 0.47
POLB P06746 2/20 0.47
KMT2A Q03164 11/20 0.46
ALDH1A1 P00352 5/20 0.46
PKM P14618 3/20 0.46
NPSR1 Q6W5P4 3/20 0.45
MEN1 O00255 3/20 0.45
SMN1; SMN2 Q16637 3/20 0.45
HSD17B10 Q99714 2/20 0.45
JAK2 O60674 1/20 0.45
USP2 O75604 1/20 0.45
ESR1 P03372 1/20 0.45
ALOX15 P16050 1/20 0.45
ESR2 Q92731 1/20 0.45
HTT P42858 1/20 0.43
TSHR P16473 1/20 0.42
PARP1 P09874 1/20 0.40
L3MBTL1 Q9Y468 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29371724 1.00 MAPT (0.47) MAPTGAALMNAPOLBKMT2A
SCHEMBL29370962 0.91 ALDH1A1 (0.50) MAPTGAALMNAPOLBKMT2A
SCHEMBL29371693 0.83 NPC1 (0.44) MAPTPOLBKMT2AALDH1A1PKM
SCHEMBL29372731 0.83 LMNA (0.56) MAPTGAALMNAPOLBKMT2A
SCHEMBL27615313 0.82 KMT2A (0.44) MAPTGAALMNAPOLBKMT2A
SCHEMBL29369022 0.82 KDM4E (0.57) MAPTGAALMNAPOLBKMT2A
SCHEMBL4647197 0.82 KDM4E (0.57) MAPTGAALMNAPOLBKMT2A
SCHEMBL29371914 0.82 MAPT (0.51) MAPTGAALMNAPOLBKMT2A
SCHEMBL9514205 0.81 SMN1; SMN2 (0.56) MAPTGAALMNAPOLBKMT2A
SCHEMBL29371761 0.81 KMT2A (0.45) MAPTGAALMNAPOLBKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4091578-B1 METHOD FOR PRODUCING PLATE DENTURE TOKUYAMA DENTAL CORP (JP) 2024-10-09 EP disclosed
US-20230137898-A1 METHOD OF PRODUCING PLATE DENTURE, CURABLE COMPOSITION FOR STEREOLITHOGRAPHY, AND PLATE DENTURE PRODUCTION KIT TOKUYAMA DENTAL CORPORATION (JP) 2023-05-04 US disclosed
EP-4091578-A1 METHOD FOR PRODUCING PLATE DENTURE, CURABLE STEREOLITHOGRAPHIC COMPOSITION, AND PLATE DENTURE PRODUCTION KIT Tokuyama Dental Corporation (JP) 2022-11-23 EP disclosed
CN-114929158-A Method for producing a denture, curable composition for photo-molding, and kit for producing a denture 株式会社德山齿科 2022-08-19 CN disclosed
EP-1591098-B1 Cationically curable composition for dental use TOKUYAMA CORP (JP) 2008-08-13 EP disclosed
US-7365106-B2 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2008-04-29 US disclosed
EP-1431315-B1 Photopolymerization initiator and photopolymerizable composition TOKUYAMA CORP (JP) 2007-10-17 EP disclosed
US-20050250868-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-10 US disclosed
EP-1591098-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-02 EP disclosed
US-20040186195-A1 Photopolymerization initiator and photopolymerizable composition TOKUYAMA CORPORATION (JP) 2004-09-23 US disclosed
EP-1431315-A2 Photopolymerization initiator and photopolymerizable composition Tokuyama Corporation (JP) 2004-06-23 EP disclosed