SCHEMBL29371246

SCHEMBL29371246

CC(=O)Oc1c2ccccc2c(OC(C)=O)c2cc(Br)ccc12

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HTT P42858 3/20 0.53
▸ MAPT P10636 3/20 0.53
▸ KDM4E B2RXH2 3/20 0.53
▸ HSD17B10 Q99714 2/20 0.53
▸ TP53 P04637 1/20 0.53
▸ GAA P10253 1/20 0.53
▸ ABCB11 O95342 1/20 0.47
▸ KMT2A Q03164 4/20 0.45
▸ MEN1 O00255 3/20 0.45
▸ RXFP1 Q9HBX9 1/20 0.44
▸ MCL1 Q07820 1/20 0.43
▸ MAPK1 P28482 1/20 0.43
▸ BACE1 P56817 1/20 0.42
▸ CASP3 P42574 1/20 0.41
▸ TUBB4A P04350 1/20 0.40
▸ TUBB P07437 1/20 0.40
▸ TUBA3C P0DPH7 1/20 0.40
▸ TUBA1B P68363 1/20 0.40
▸ TUBA4A P68366 1/20 0.40
▸ TUBB4B P68371 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9643968 0.85 ABCB11 (0.67) HTTMAPTKDM4EHSD17B10TP53
SCHEMBL29368738 0.83 KDM4E (0.63) HTTMAPTKDM4EHSD17B10TP53
SCHEMBL6907648 0.83 KDM4E (0.63) HTTMAPTKDM4EHSD17B10TP53
SCHEMBL24893028 0.82 KMT2A (0.41) HTTMAPTKDM4EHSD17B10TP53
SCHEMBL29371403 0.82 MEN1 (0.41) HTTMAPTKDM4EHSD17B10TP53
SCHEMBL24897463 0.81 KMT2A (0.40) MAPTKDM4EHSD17B10TP53GAA
SCHEMBL20398467 0.81 HTT (0.58) HTTMAPTKDM4EHSD17B10TP53
SCHEMBL29372682 0.81 HTT (0.58) HTTMAPTKDM4EHSD17B10TP53
SCHEMBL20398637 0.80 HTT (0.67) HTTMAPTKDM4EHSD17B10TP53
SCHEMBL30434021 0.80 HTT (0.67) HTTMAPTKDM4EHSD17B10TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 — — CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 — — CN disclosed
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