SCHEMBL29371981

SCHEMBL29371981

O=C(Oc1c2ccccc2c(OC(=O)c2ccccc2)c2c(Cl)cccc12)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 9/20 0.45
MAPT P10636 8/20 0.45
NPSR1 Q6W5P4 4/20 0.45
GAA P10253 3/20 0.45
SMN1; SMN2 Q16637 3/20 0.45
MEN1 O00255 2/20 0.45
HSD17B10 Q99714 2/20 0.45
ESR1 P03372 2/20 0.45
ESR2 Q92731 2/20 0.45
JAK2 O60674 1/20 0.45
USP2 O75604 1/20 0.45
ALOX15 P16050 1/20 0.45
LMNA P02545 5/20 0.44
POLB P06746 1/20 0.44
ALDH1A1 P00352 3/20 0.43
HTT P42858 3/20 0.43
PKM P14618 2/20 0.43
KDM4E B2RXH2 2/20 0.41
PARP1 P09874 1/20 0.40
F2 P00734 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29368995 0.88 KMT2A (0.48) KMT2AMAPTNPSR1GAASMN1; SMN2
SCHEMBL7710152 0.84 MAPT (0.43) KMT2AMAPTNPSR1GAASMN1; SMN2
SCHEMBL29371006 0.83 NPC1 (0.47) KMT2AMAPTSMN1; SMN2MEN1HSD17B10
SCHEMBL29372731 0.83 LMNA (0.56) KMT2AMAPTNPSR1GAASMN1; SMN2
SCHEMBL9161406 0.81 LMNA (0.50) KMT2AMAPTNPSR1GAASMN1; SMN2
SCHEMBL4645178 0.81 MAPT (0.47) KMT2AMAPTNPSR1GAASMN1; SMN2
SCHEMBL29371468 0.81 KMT2A (0.45) KMT2AMAPTNPSR1GAASMN1; SMN2
SCHEMBL29371724 0.81 MAPT (0.47) KMT2AMAPTNPSR1GAASMN1; SMN2
SCHEMBL29371761 0.81 KMT2A (0.45) KMT2AMAPTNPSR1GAASMN1; SMN2
SCHEMBL29368592 0.81 KDM4E (0.47) KMT2AMAPTNPSR1GAASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 CN disclosed