SCHEMBL29375797

SCHEMBL29375797

CC(=O)n1nnc2ncccc21

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ASAH1 Q13510 2/20 0.56
▸ MGLL Q99685 3/20 0.51
▸ TUBB4A P04350 2/20 0.49
▸ TUBB P07437 2/20 0.49
▸ TUBA3C P0DPH7 2/20 0.49
▸ TUBA1B P68363 2/20 0.49
▸ TUBA4A P68366 2/20 0.49
▸ TUBB4B P68371 2/20 0.49
▸ TUBB3 Q13509 2/20 0.49
▸ TUBB2A Q13885 2/20 0.49
▸ TUBB8 Q3ZCM7 2/20 0.49
▸ TUBA3E Q6PEY2 2/20 0.49
▸ TUBA1A Q71U36 2/20 0.49
▸ TUBA1C Q9BQE3 2/20 0.49
▸ TUBB6 Q9BUF5 2/20 0.49
▸ TUBB2B Q9BVA1 2/20 0.49
▸ TUBB1 Q9H4B7 2/20 0.49
▸ BRD4 O60885 1/20 0.37
▸ BRD2 P25440 1/20 0.37
▸ BRD3 Q15059 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2123309 1.00 ASAH1 (0.56) ASAH1MGLLTUBB4ATUBBTUBA3C
SCHEMBL425013 0.82 ASAH1 (0.52) ASAH1MGLLTUBB4ATUBBTUBA3C
SCHEMBL13246518 0.77 MGLL (0.56) ASAH1MGLLTUBB4ATUBBTUBA3C
SCHEMBL13246475 0.77 MGLL (0.62) ASAH1MGLLKMT2AHPGDFAAH
SCHEMBL916881 0.74 MGLL (0.73) ASAH1MGLLFAAH
SCHEMBL12116960 0.73 ASAH1 (0.50) ASAH1MGLLTUBB4ATUBBTUBA3C
SCHEMBL13246506 0.73 ASAH1 (0.62) ASAH1MGLLTUBB4ATUBBTUBA3C
SCHEMBL13246559 0.73 MGLL (0.74) ASAH1MGLLFAAH
SCHEMBL3231181 0.73 MGLL (0.65) ASAH1MGLLFAAH
SCHEMBL1277493 0.73 TUBB4A (0.44) ASAH1MGLLTUBB4ATUBBTUBA3C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4337630-A1 6-HYDROXY-CANNABIDIOL-C4 GW Research Limited (GB) 2024-03-20 — — EP claimed
EP-4337631-A1 DERIVATIVES OF CANNABIDIOL-C4 FOR THE TREATMENT OF EPILEPSY GW Research Limited (GB) 2024-03-20 — — EP claimed
CN-117295706-A cannabidiol-C4 derivatives for the treatment of epilepsy 吉伟研究有限公司 2023-12-26 — — CN claimed
CN-117242049-A 6-hydroxy-cannabidiol-C4 吉伟研究有限公司 2023-12-15 — — CN claimed
CN-116867795-A Novel method for producing antibody-immunostimulant conjugate 第一三共株式会社 2023-10-10 — — CN claimed
WO-2022238699-A1 6-HYDROXY-CANNABIDIOL-C4 GW Research Limited (GB) 2022-11-17 — — WO claimed
WO-2022238700-A1 DERIVATIVES OF CANNABIDIOL-C4 FOR THE TREATMENT OF EPILEPSY GW Research Limited (GB) 2022-11-17 — — WO claimed
WO-2022163846-A1 NOVEL METHOD FOR PRODUCING ANTIBODY-IMMUNOSTIMULATOR CONJUGATE 第一三共株式会社 2022-08-04 — — WO claimed
US-20250201546-A1 METHOD FOR PROCESSING SUBSTRATE, KIT FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE TOKYO OHKA KOGYO CO., LTD. (JP) 2025-06-19 — — US disclosed
EP-4337630-A1 6-HYDROXY-CANNABIDIOL-C4 GW Research Limited (GB) 2024-03-20 — — EP disclosed
EP-4337631-A1 DERIVATIVES OF CANNABIDIOL-C4 FOR THE TREATMENT OF EPILEPSY GW Research Limited (GB) 2024-03-20 — — EP disclosed
WO-2024024935-A1 NOVEL METHOD FOR PRODUCING ANTIBODY-DRUG CONJUGATE HAVING ANTINEOPLASTIC EFFECT 第一三共株式会社 2024-02-01 — — WO disclosed
CN-117295706-A cannabidiol-C4 derivatives for the treatment of epilepsy 吉伟研究有限公司 2023-12-26 — — CN disclosed
CN-117242049-A 6-hydroxy-cannabidiol-C4 吉伟研究有限公司 2023-12-15 — — CN disclosed
WO-2022238699-A1 6-HYDROXY-CANNABIDIOL-C4 GW Research Limited (GB) 2022-11-17 — — WO disclosed
WO-2022238700-A1 DERIVATIVES OF CANNABIDIOL-C4 FOR THE TREATMENT OF EPILEPSY GW Research Limited (GB) 2022-11-17 — — WO disclosed
WO-2022163846-A1 NOVEL METHOD FOR PRODUCING ANTIBODY-IMMUNOSTIMULATOR CONJUGATE 第一三共株式会社 2022-08-04 — — WO disclosed
CN-111587473-B Polishing composition using polishing particles having high water affinity 日产化学株式会社 2022-07-05 — — CN disclosed
CN-114437872-A Cleaning composition and cleaning method for component of process chamber for semiconductor manufacturing 东京应化工业株式会社 2022-05-06 — — CN disclosed
CN-114026195-A Polishing composition containing basic substance and using highly hydrophilic polishing particles 日产化学株式会社 2022-02-08 — — CN disclosed
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