Benzoquinone

Benzoquinone

SCHEMBL2944684

Cc1cccc2c1ccc1cc(C(C)C)ccc12.O=C1C=CC(=O)C=C1

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 4/20 0.41
ALDH1A1 P00352 3/20 0.41
HPGD P15428 2/20 0.41
HSD17B10 Q99714 1/20 0.41
AKR1B1 P15121 1/20 0.40
HIF1A Q16665 1/20 0.39
EPAS1 Q99814 1/20 0.39
CYP2A6 P11509 3/20 0.38
KIF11 P52732 1/20 0.36
LMNA P02545 1/20 0.35
HDAC4 P56524 2/20 0.35
HDAC8 Q9BY41 2/20 0.35
KDM4E B2RXH2 2/20 0.35
MDM4 O15151 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
TP53 P04637 1/20 0.35
CYP3A4 P08684 1/20 0.35
MAPT P10636 1/20 0.35
TYR P14679 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29355679 0.91 CYP1A2 (0.49) CYP1A2ALDH1A1HPGDHSD17B10AKR1B1
SCHEMBL596870 0.91 CYP1A2 (0.49) CYP1A2ALDH1A1HPGDHSD17B10AKR1B1
SCHEMBL31553088 0.91 CYP1A2 (0.49) CYP1A2ALDH1A1HPGDHSD17B10AKR1B1
Phosphine SCHEMBL4303780 0.89 CYP1A2 (0.47) CYP1A2ALDH1A1HPGDHSD17B10AKR1B1
SCHEMBL598329 0.81 CYP1A2 (0.49) CYP1A2ALDH1A1HPGDHSD17B10AKR1B1
SCHEMBL7927384 0.79 CYP1A2 (0.59) CYP1A2ALDH1A1HPGDHSD17B10AKR1B1
SCHEMBL3912740 0.77 UGT2B7 (0.45) CYP1A2ALDH1A1AKR1B1HIF1AKIF11
SCHEMBL598202 0.73 AKR1B1 (0.54) CYP1A2ALDH1A1HPGDHSD17B10AKR1B1
SCHEMBL28136088 0.73 LMNA (0.47) CYP1A2ALDH1A1HPGDHSD17B10AKR1B1
SCHEMBL5026892 0.72 CYP1A2 (0.59) CYP1A2ALDH1A1HPGDHSD17B10CYP2A6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 127 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110050356-B Composition for organic electronic element encapsulation and encapsulation formed by using composition 莫门蒂夫性能材料韩国株式会社 2023-06-13 CN disclosed
CN-110520786-A Glass and plastic laminated hybrid lens and manufacturing method thereof ESSILOR INT 2019-11-29 CN disclosed
CN-109791978-A Composition for organic electronic element encapsulant, and encapsulant formed using the same 莫门蒂夫性能材料韩国株式会社 2019-05-21 CN disclosed
CN-103631093-B The manufacture method of the organic light-emitting display device of photoresist and the use photoresist 乐金显示有限公司 2018-03-20 CN disclosed
CN-107257827-A Composition and the sealant using said composition formation for organic electronic device sealant 莫门蒂夫性能材料韩国株式会社 2017-10-17 CN disclosed
CN-105315788-A UV-curable dielectric inks for photovoltaic modules DU PONT 2016-02-10 CN disclosed
CN-104749877-A IMAGING THREE DIMENSIONAL SUBSTRATES USING A TRANSFER FILM ROHM & HAAS ELECT MAT 2015-07-01 CN disclosed
US-20140084778-A1 PLASMA DISPLAY PANEL AND METHOD FOR PRODUCING THE SAME PANASONIC CORPORATION (JP) 2014-03-27 US disclosed
CN-103681163-A Method of manufacturing PDP bus electrode DU PONT 2014-03-26 CN disclosed
CN-103631093-A Photoresist film and manufacturing method for organic light emitting display device using the same LG DISPLAY CO LTD 2014-03-12 CN disclosed
CN-1041045-A The ceramic coating composition of photosensitive semi-aqueous developable DU PONT (US) 1990-04-04 CN disclosed
CN-1040198-A Has the active photopolymerization sensitizing agent of long wave DU PONT (US) 1990-03-07 CN disclosed
CN-1039488-A The water-soluble light sensitive ceramics clad compositions that can develop DU PONT (US) 1990-02-07 CN disclosed
CN-1036083-A In photopolymerizable layer, form the method for reflection hologram DU PONT (US) 1989-10-04 CN disclosed
CN-1035364-A PHOTOPOLYMERIZABLE COMPOSITIONS AND ELEMENTS FOR REFRACTIVE INDEX IMAGING DU PONT (US) 1989-09-06 CN disclosed
CN-1035006-A Contain electron accepter or give the photohardenable electrostatic transfer printing grand master pattern of body DU PONT (US) 1989-08-23 CN disclosed
CN-1035005-A Has the photohardenable static printing grand master pattern that improves the reverse transfer and the electrical property that disappears DU PONT (US) 1989-08-23 CN disclosed
CN-87106835-A Photosensitive polymerization film and the laminating method that scribbles photosensitivity liquid ground 1988-10-05 CN disclosed
CN-88100085-A Microcapsules are enriched in the photosensitive composition on surface 1988-07-27 CN disclosed
CN-86100150-A PHOTOSENSITIVE POLYMER COMPOSITION AND ELECTROPHORETIC DEPOSITION PROCESS THEREOF 1987-07-22 CN disclosed