Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AHR | P35869 | 3/20 | 0.49 |
| ▸ | TUBB4A | P04350 | 2/20 | 0.43 |
| ▸ | TUBB | P07437 | 2/20 | 0.43 |
| ▸ | TUBA3C | P0DPH7 | 2/20 | 0.43 |
| ▸ | TUBA1B | P68363 | 2/20 | 0.43 |
| ▸ | TUBA4A | P68366 | 2/20 | 0.43 |
| ▸ | TUBB4B | P68371 | 2/20 | 0.43 |
| ▸ | TUBB3 | Q13509 | 2/20 | 0.43 |
| ▸ | TUBB2A | Q13885 | 2/20 | 0.43 |
| ▸ | TUBB8 | Q3ZCM7 | 2/20 | 0.43 |
| ▸ | TUBA3E | Q6PEY2 | 2/20 | 0.43 |
| ▸ | TUBA1A | Q71U36 | 2/20 | 0.43 |
| ▸ | TUBA1C | Q9BQE3 | 2/20 | 0.43 |
| ▸ | TUBB6 | Q9BUF5 | 2/20 | 0.43 |
| ▸ | TUBB2B | Q9BVA1 | 2/20 | 0.43 |
| ▸ | TUBB1 | Q9H4B7 | 2/20 | 0.43 |
| ▸ | CYP1A1 | P04798 | 5/20 | 0.42 |
| ▸ | CYP1B1 | Q16678 | 5/20 | 0.42 |
| ▸ | ESR1 | P03372 | 4/20 | 0.42 |
| ▸ | MAOA | P21397 | 3/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL499390 | 1.00 | AHR (0.49) | AHRTUBB4ATUBBTUBA3CTUBA1B | |
| SCHEMBL499391 | 1.00 | AHR (0.49) | AHRTUBB4ATUBBTUBA3CTUBA1B | |
| SCHEMBL499096 | 0.95 | TUBB4A (0.41) | AHRTUBB4ATUBBTUBA3CTUBA1B | |
| SCHEMBL499095 | 0.95 | TUBB4A (0.41) | AHRTUBB4ATUBBTUBA3CTUBA1B | |
| SCHEMBL990436 | 0.91 | ESR1 (0.40) | AHRTUBB4ATUBBTUBA3CTUBA1B | |
| SCHEMBL990438 | 0.91 | ESR1 (0.40) | AHRTUBB4ATUBBTUBA3CTUBA1B | |
| SCHEMBL29447154 | 0.90 | ESR1 (0.54) | AHRTUBB4ATUBBTUBA3CTUBA1B | |
| SCHEMBL499043 | 0.90 | ESR1 (0.54) | AHRTUBB4ATUBBTUBA3CTUBA1B | |
| SCHEMBL499044 | 0.90 | ESR1 (0.54) | AHRTUBB4ATUBBTUBA3CTUBA1B | |
| SCHEMBL5188290 | 0.89 | AHR (0.46) | AHRTUBB4ATUBBTUBA3CTUBA1B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120065622-A | Photosensitive resin composition and method for producing microlens | 东京应化工业株式会社 | 2025-05-30 | — | — | CN | disclosed |
| CN-119620544-A | Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2025-03-14 | — | — | CN | disclosed |
| CN-115524923-B | Negative photosensitive resin composition, patterning method and application thereof | 深圳市容大感光科技股份有限公司 | 2024-11-19 | — | — | CN | disclosed |
| CN-110317174-B | Hydrogen barrier agent, composition for forming hydrogen barrier film, method for producing hydrogen barrier film, and electronic device | 东京应化工业株式会社 | 2024-10-22 | — | — | CN | disclosed |
| CN-117590696-A | Photosensitive resin composition | 东京应化工业株式会社 | 2024-02-23 | — | — | CN | disclosed |
| CN-109709770-B | Resin composition, dry film and method for producing same, method for producing resist film and substrate, method for producing plated molded article, and mercapto compound | 东京应化工业株式会社 | 2023-11-24 | — | — | CN | disclosed |
| WO-2023162552-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD FOR SUBSTRATE WITH TEMPLATE, AND PRODUCTION METHOD FOR PLATED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023162551-A1 | METHOD FOR PRODUCING PLATED SHAPED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| CN-116360213-A | Resin composition and photoresist patterning method using the same | 深圳市容大感光科技股份有限公司 | 2023-06-30 | — | — | CN | disclosed |
| CN-115524923-A | Negative photosensitive resin composition, and patterning method and application thereof | 深圳市容大感光科技股份有限公司 | 2022-12-27 | — | — | CN | disclosed |
| CN-111217946-B | Composition comprising a compound containing a vinyl group | 东京应化工业株式会社 | 2022-12-06 | — | — | CN | disclosed |
| CN-115087928-A | Resist pattern forming method | 东京应化工业株式会社 | 2022-09-20 | — | — | CN | disclosed |
| CN-107390472-B | Chemically amplified positive photosensitive resin composition | 东京应化工业株式会社 | 2022-09-06 | — | — | CN | disclosed |
| CN-114967342-A | Positive photosensitive composition and dry film, patterned resist film, substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2022-08-30 | — | — | CN | disclosed |
| CN-114967343-A | Positive photosensitive composition and dry film, patterned resist film, substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2022-08-30 | — | — | CN | disclosed |
| CN-114902134-A | Chemically amplified photosensitive composition, photosensitive dry film and method for producing same, method for producing resist film, and acid diffusion inhibitor | 东京应化工业株式会社 | 2022-08-12 | — | — | CN | disclosed |
| CN-114641727-A | Method for producing photosensitive composition, premix for production, photosensitive composition, dry film, and method for producing resist film | 东京应化工业株式会社 | 2022-06-17 | — | — | CN | disclosed |
| CN-114207524-A | Resin composition, dry film, resist film, compound, acid generator, and method for producing N-organic sulfonyloxy compound | 东京应化工业株式会社 | 2022-03-18 | — | — | CN | disclosed |