SCHEMBL2949786

SCHEMBL2949786

O=C1C=CC(=O)C(C(Br)(Br)Br)=C1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.42
ALDH1A1 P00352 2/20 0.42
RECQL P46063 2/20 0.42
MEN1 O00255 2/20 0.42
MAPT P10636 2/20 0.42
KMT2A Q03164 2/20 0.42
HPGD P15428 1/20 0.42
ALOX12 P18054 1/20 0.42
MAOA P21397 4/20 0.39
MAOB P27338 4/20 0.39
ERBB2 P04626 1/20 0.37
MAPK1 P28482 2/20 0.37
ACHE P22303 2/20 0.37
BCHE P06276 1/20 0.37
POLB P06746 1/20 0.37
APEX1 P27695 1/20 0.37
CASP1 P29466 1/20 0.37
BLM P54132 1/20 0.37
MDM2 Q00987 1/20 0.37
DHODH Q02127 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL49453 0.76 MAPT (0.43) TDP1ALDH1A1RECQLMEN1MAPT
SCHEMBL2430845 0.76 ALDH1A1 (0.40) TDP1ALDH1A1RECQLMEN1MAPT
Water SCHEMBL28271857 0.74 MAPT (0.41) TDP1ALDH1A1RECQLMEN1MAPT
SCHEMBL28319251 0.74 MAPT (0.41) TDP1ALDH1A1RECQLMEN1MAPT
SCHEMBL28257022 0.74 MAPT (0.41) TDP1ALDH1A1RECQLMEN1MAPT
SCHEMBL8613270 0.69 ACHE (0.37) TDP1ALDH1A1RECQLMEN1MAPT
SCHEMBL11153917 0.67 ERBB2 (0.34) TDP1ALDH1A1RECQLMEN1MAPT
Acetic Acid SCHEMBL3659086 0.67 MAPT (0.36) TDP1ALDH1A1RECQLMEN1MAPT
SCHEMBL3628595 0.66 ACHE (0.39) TDP1ALDH1A1RECQLMEN1MAPT
SCHEMBL783397 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7670745-B2 Alkali soluble polymer and positive working photosensitive resin composition using the same CHISSO CORPORATION (JP) 2010-03-02 US disclosed
US-20080131813-A1 Alkali soluble polymer and positive working photosensitive resin composition using the same CHISSO CORPORATION 2008-06-05 US disclosed
US-6664021-B1 Acid generator and silicon-containing polyimide ester precursor comprising partially esterified silicon-containing polyamic ester; radiating with light CHISSO CORPORATION (JP) 2003-12-16 US disclosed
US-5753407-A Polyamic acid composition KABUSHIKI KAISHA TOSHIBA (JP) 1998-05-19 US disclosed
US-5585217-A Polyamic acid composition KABUSHIKI KAISHA TOSHIBA (JP) 1996-12-17 US disclosed
US-5449705-A Silicon-containing polyamic acid derivative and photosensitive resin composition using it CHISSO CORPORATION (JP) 1995-09-12 US disclosed
US-5449588-A Shrinkage inhibition CHISSO CORPORATION (JP) 1995-09-12 US disclosed
US-5442024-A Polyamic acid having a crosslinkable silane group or copolymerized with a polysiloxane and a compound generating an acid catalyst to effect imidation upon radiating; films; photoresists; shrinkage inhibition; resolution; adhesion CHISSO CORPORATION (JP) 1995-08-15 US disclosed