⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19499984 | 1.00 | — | — | |
| SCHEMBL2950549 | 0.97 | — | — | |
| SCHEMBL2960889 | 0.97 | — | — | |
| SCHEMBL19499977 | 0.90 | — | — | |
| SCHEMBL649382 | 0.90 | — | — | |
| SCHEMBL5459591 | 0.90 | — | — | |
| SCHEMBL863089 | 0.88 | — | — | |
| SCHEMBL14865745 | 0.87 | — | — | |
| SCHEMBL5465527 | 0.86 | — | — | |
| SCHEMBL10000287 | 0.85 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230383027-A1 | CURABLE COMPOSITION FOR IMPRINTING, CURED SUBSTANCE, IMPRINT PATTERN PRODUCING METHOD, AND METHOD FOR MANUFACTURING DEVICE | FUJIFILM CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |
| US-20230383044-A1 | COMPOSITION FOR FORMING IMPRINT PATTERN, CURED SUBSTANCE, IMPRINT PATTERN PRODUCING METHOD, DEVICE, AND METHOD FOR MANUFACTURING DEVICE | FUJIFILM CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |
| US-20230250311-A1 | METHOD FOR PRODUCING COMPOSITION FOR FORMING INTERLAYER FOR NANOIMPRINT, METHOD FOR PRODUCING LAMINATE, IMPRINT PATTERN PRODUCING METHOD, AND METHOD FOR MANUFACTURING DEVICE | FUJIFILM CORPORATION (JP) | 2023-08-10 | — | — | US | disclosed |
| US-20230219280-A1 | METHOD FOR PRODUCING COMPOSITION FOR FORMING IMPRINT PATTERN, METHOD FOR PRODUCING CURED SUBSTANCE, IMPRINT PATTERN PRODUCING METHOD, AND METHOD FOR MANUFACTURING DEVICE | FUJIFILM CORPORATION (JP) | 2023-07-13 | — | — | US | disclosed |
| US-20170306062-A1 | CURABLE COMPOSITION, RESIST MATERIAL AND RESIST FILM | DIC CORPORATION (JP) | 2017-10-26 | — | — | US | disclosed |
| US-20100233482-A1 | Organic silicon oxide fine particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device | HAMADA YOSHITAKA | 2010-09-16 | — | — | US | disclosed |
| US-7754330-B2 | Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-13 | — | — | US | disclosed |
| US-20090294726-A1 | ORGANIC SILICON OXIDE FINE PARTICLES AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-12-03 | — | — | US | disclosed |
| US-20090294922-A1 | ORGANIC SILICON OXIDE FINE PARTICLE AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE | PANASONIC CORPORATION (JP) | 2009-12-03 | — | — | US | disclosed |