⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2950549 | 0.94 | — | — | |
| SCHEMBL19168534 | 0.94 | — | — | |
| SCHEMBL2960889 | 0.93 | — | — | |
| SCHEMBL2950154 | 0.90 | — | — | |
| SCHEMBL19499984 | 0.90 | — | — | |
| SCHEMBL5465527 | 0.89 | — | — | |
| SCHEMBL11291008 | 0.89 | — | — | |
| SCHEMBL19499977 | 0.87 | — | — | |
| SCHEMBL5459591 | 0.86 | — | — | |
| SCHEMBL16980579 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 187 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11826586-B2 | Method for dyeing keratin material, comprising the use of an organic C1-C6-alkoxy-silane and an alkalising agent | HENKEL AG & CO. KGAA (DE) | 2023-11-28 | — | — | US | disclosed |
| US-20230320946-A1 | PIGMENT SUSPENSION AND COSMETIC AGENT PREPARED USING THE PIGMENT SUSPENSION | HENKEL AG & CO. KGAA (DE) | 2023-10-12 | — | — | US | disclosed |
| US-11737967-B2 | Increasing the stability of agents for treating keratin material | HENKEL AG & CO. KGAA (DE) | 2023-08-29 | — | — | US | disclosed |
| US-20230240963-A1 | PIGMENT SUSPENSION AND COSMETIC AGENT PREPARED USING THE PIGMENT SUSPENSION | HENKEL AG & CO. KGAA (DE) | 2023-08-03 | — | — | US | disclosed |
| US-20230181443-A1 | METHOD FOR TREATING HUMAN HAIR WITH AGENTS CONTAINING MIXTURES OF ORGANIC C1-C6 ALKOXY SILOXANES | HENKEL AG & CO. KGAA (DE) | 2023-06-15 | — | — | US | disclosed |
| US-20230142684-A1 | Single Precursor Low-K Film Deposition and UV Cure for Advanced Technology Node | APPLIED MATERIALS, INC. (US) | 2023-05-11 | — | — | US | disclosed |
| EP-2857436-B1 | POLYMER HAVING TERMINAL STRUCTURE INCLUDING PLURALITY OF REACTIVE SILICON GROUPS, METHOD FOR MANUFACTURING SAME, AND USE FOR SAME | KANEKA CORP (JP) | 2019-10-09 | — | — | EP | disclosed |
| EP-1520891-B1 | FILM FORMING COMPOSITION, PROCESS FOR PRODUCING FILM FORMING COMPOSITION, INSULATING FILM FORMING MATERIAL, PROCESS FOR FORMING FILM, AND SILICA-BASED FILM | JSR CORP (JP) | 2019-05-01 | — | — | EP | disclosed |
| US-9969843-B2 | Polymer having terminal structure including plurality of reactive silicon groups, method for manufacturing same, and use for same | KANEKA CORPORATION (JP) | 2018-05-15 | — | — | US | disclosed |
| US-9803052-B2 | Polymer having terminal structure including plurality of reactive silicon groups, method for manufacturing same, and use for same | KANEKA CORPORATION (JP) | 2017-10-31 | — | — | US | disclosed |
| EP-1146092-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-17 | — | — | EP | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-20010009936-A1 | Method of manufacturing material for forming insulating film | JSR CORPORATION (JP) | 2001-07-26 | — | — | US | disclosed |
| EP-1117102-A2 | Method of manufacturing material for forming insulating film | JSR Corporation (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| EP-1058274-A1 | Composition for film formation and material for insulating film formation | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |