SCHEMBL29501786

SCHEMBL29501786

O=C(CC1CCCCC1)C(=O)c1ccc(Sc2ccccc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 2/20 0.46
ALDH1A1 P00352 1/20 0.45
HPGD P15428 1/20 0.45
NPC1 O15118 3/20 0.43
RAB9A P51151 3/20 0.43
KMT2A Q03164 2/20 0.40
CHRNA7 P36544 1/20 0.40
PTGES O14684 1/20 0.39
ALOX5 P09917 1/20 0.39
CHEK2 O96017 1/20 0.38
EZH2 Q15910 1/20 0.38
EPHX1 P07099 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29413079 0.99 HPGD (0.46) EPHX2ALDH1A1HPGDNPC1RAB9A
SCHEMBL30833171 0.86 EPHX2 (0.43) EPHX2ALDH1A1HPGDNPC1RAB9A
M-Phenoxybenzoic Acid For Cis-Isomer SCHEMBL29029865 0.84 AKR1C3 (0.49) NPC1RAB9APTGESALOX5
SCHEMBL30296962 0.84 HPGD (0.44) EPHX2ALDH1A1HPGDNPC1RAB9A
SCHEMBL30702812 0.84 LMNA (0.46) ALDH1A1HPGDNPC1RAB9AKMT2A
SCHEMBL24634212 0.84 EPHX2 (0.42) EPHX2ALDH1A1HPGDNPC1RAB9A
SCHEMBL29503070 0.84 EPHX2 (0.42) EPHX2ALDH1A1HPGDNPC1RAB9A
SCHEMBL860742 0.82 HPGD (0.42) EPHX2ALDH1A1HPGDNPC1RAB9A
SCHEMBL29990476 0.81 EPHX2 (0.38) EPHX2ALDH1A1HPGDNPC1RAB9A
SCHEMBL29990873 0.81 NR4A2 (0.55) KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4067998-B1 EO/PO MODIFIED 9-PHENYLACRIDINE PHOTOSENSITIZERS FOR USE IN PHOTOSENSITIVE RESINS IN THE MANUFACTURE OF PRINTED CIRCUIT BOARDS CHANGZHOU TRONLY NEW ELECTRONIC MAT CO LTD (CN) 2025-11-12 EP disclosed
CN-119422109-A Photosensitive composition, film, optical filter, solid-state imaging element, and image display device 富士胶片株式会社 2025-02-11 CN disclosed
CN-119403885-A Resin composition, method for producing resin composition, pigment derivative, film, optical filter, solid-state imaging element, and image display device 富士胶片株式会社 2025-02-07 CN disclosed
CN-117916279-A Composition, resin, film and optical sensor 富士胶片株式会社 2024-04-19 CN disclosed
CN-117192896-A Photosensitive resin composition, film of photosensitive resin composition, and electronic device 杭州福斯特电子材料有限公司 2023-12-08 CN disclosed
US-20230167066-A1 ETHOXY/PROPOXY MODIFIED PYRAZOLINE ORGANIC MATTER, APPLICATION THEREOF, PHOTOCURABLE COMPOSITION, AND PHOTORESIST CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD. (CN) 2023-06-01 US disclosed
EP-4140983-A1 ETHOXY/PROPOXY MODIFIED PYRAZOLINE ORGANIC MATTER, APPLICATION THEREOF, PHOTOCURABLE COMPOSITION, AND PHOTORESIST Changzhou Tronly New Electronic Materials Co., Ltd. (CN) 2023-03-01 EP disclosed
US-20230016182-A1 EO/PO-MODIFIED 9-PHENYLACRIDINE PHOTOSENSITIZERS AND APPLICATION THEREOF CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD. (CN) 2023-01-19 US disclosed
CN-115128899-A Photosensitive resin composition with improved system hue stability 常州正洁智造科技有限公司 2022-09-30 CN disclosed
WO-2022199625-A1 PHOTOSENSITIVE RESIN COMPOSITION HAVING IMPROVED SYSTEM HUE STABILITY 常州正洁智造科技有限公司 2022-09-29 WO disclosed
CN-111752091-B Application of HABI mixed photoinitiator in UVLED photocuring 常州正洁智造科技有限公司 2022-09-06 CN disclosed
CN-112835261-B EO/PO modified 9-phenylacridine photosensitizer and application thereof 常州强力电子新材料股份有限公司 2022-06-07 CN disclosed
CN-114442425-A Curable resin composition, solder resist film formed from the same, interlayer insulating material, and printed wiring board 常州正洁智造科技有限公司 2022-05-06 CN disclosed
WO-2022089228-A1 CURABLE RESIN COMPOSITION AND SOLDER RESIST FILM FORMED THEREFROM, INTERLAYER INSULATING MATERIAL, AND PRINTED CIRCUIT BOARD 常州正洁智造科技有限公司 2022-05-05 WO disclosed
CN-114326299-A Photosensitive resin composition, optical filter and application 常州强力电子新材料股份有限公司 2022-04-12 CN disclosed
CN-114326309-A Photosensitive resin composition and application thereof 常州正洁智造科技有限公司 2022-04-12 CN disclosed
CN-111752099-B Photosensitive resin composition, application thereof, color filter and image display device 常州强力电子新材料股份有限公司 2022-03-22 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230167066-A1 ETHOXY/PROPOXY MODIFIED PYRAZOLINE ORGANIC MATTER, APPLICATION THEREOF, PHOTOCURABLE COMPOSITION, AND PHOTORESIST PPOX, PLK2, CCNO EPHX2 1187/4885ALDH1A1 2522/4885HPGD 2309/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.