Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADORA2A | P29274 | 2/20 | 0.44 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.44 |
| ▸ | DYRK1A | Q13627 | 1/20 | 0.43 |
| ▸ | CLK4 | Q9HAZ1 | 1/20 | 0.43 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | KDM1A | O60341 | 2/20 | 0.40 |
| ▸ | KDM1B | Q8NB78 | 2/20 | 0.40 |
| ▸ | MAOB | P27338 | 2/20 | 0.40 |
| ▸ | AKR1C3 | P42330 | 2/20 | 0.40 |
| ▸ | AKR1C2 | P52895 | 2/20 | 0.40 |
| ▸ | RPS6KA3 | P51812 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | NPY5R | Q15761 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6935529 | 1.00 | ADORA2A (0.44) | ADORA2AADORA1DYRK1ACLK4NPC1 | |
| SCHEMBL6937126 | 0.90 | DYRK1A (0.46) | ADORA2AADORA1DYRK1ACLK4KDM1A | |
| SCHEMBL29579894 | 0.90 | DYRK1A (0.46) | ADORA2AADORA1DYRK1ACLK4KDM1A | |
| SCHEMBL29508331 | 0.87 | DYRK1A (0.42) | ADORA2AADORA1DYRK1ACLK4KDM1A | |
| SCHEMBL6937881 | 0.87 | DYRK1A (0.42) | ADORA2AADORA1DYRK1ACLK4KDM1A | |
| SCHEMBL30040209 | 0.87 | DYRK1A (0.46) | ADORA2AADORA1DYRK1ACLK4NPC1 | |
| SCHEMBL6940381 | 0.87 | DYRK1A (0.46) | ADORA2AADORA1DYRK1ACLK4NPC1 | |
| SCHEMBL6935907 | 0.86 | ADORA2A (0.43) | ADORA2AADORA1DYRK1ACLK4NPC1 | |
| SCHEMBL29888758 | 0.86 | ADORA2A (0.43) | ADORA2AADORA1DYRK1ACLK4NPC1 | |
| SCHEMBL6935491 | 0.84 | DYRK1A (0.44) | ADORA2AADORA1DYRK1ACLK4KDM1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114114841-B | Photosensitive resin laminate and method for forming resist pattern | 旭化成株式会社 | 2026-05-12 | — | — | CN | disclosed |
| CN-120044756-A | Photosensitive resin composition | 旭化成株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-112368642-B | Photosensitive resin composition and method for forming resist pattern | 旭化成株式会社 | 2025-03-21 | — | — | CN | disclosed |
| CN-112534351-B | Photosensitive resin composition and method for forming resist pattern | 旭化成株式会社 | 2025-03-18 | — | — | CN | disclosed |
| CN-115524922-B | Photosensitive resin composition | 旭化成株式会社 | 2025-02-18 | — | — | CN | disclosed |
| CN-112987496-B | Photosensitive resin composition and transfer film using same | 旭化成株式会社 | 2024-06-14 | — | — | CN | disclosed |
| CN-114437251-B | Photosensitive resin composition | 旭化成株式会社 | 2024-02-20 | — | — | CN | disclosed |
| CN-111492309-B | Photosensitive resin laminate | 旭化成株式会社 | 2023-12-12 | — | — | CN | disclosed |
| CN-111527450-B | Photosensitive resin laminate and method for producing same | 旭化成株式会社 | 2023-08-08 | — | — | CN | disclosed |
| CN-111596526-B | Photosensitive resin composition and photosensitive resin laminate | 旭化成株式会社 | 2023-07-25 | — | — | CN | disclosed |
| WO-2023136333-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, AND RESIST PATTERN FORMATION METHOD | 旭化成株式会社 | 2023-07-20 | — | — | WO | disclosed |
| CN-116300314-A | Photosensitive resin composition | 旭化成株式会社 | 2023-06-23 | — | — | CN | disclosed |
| CN-109690404-B | Photosensitive resin composition and photosensitive resin laminate | 旭化成株式会社 | 2023-04-04 | — | — | CN | disclosed |
| CN-110446976-B | Photosensitive resin composition | 旭化成株式会社 | 2023-03-24 | — | — | CN | disclosed |
| CN-110095937-B | Photosensitive resin laminate and method for producing resist pattern | 旭化成株式会社 | 2023-02-28 | — | — | CN | disclosed |
| CN-115524922-A | Photosensitive resin composition | 旭化成株式会社 | 2022-12-27 | — | — | CN | disclosed |
| CN-110325913-B | Photosensitive resin composition | 旭化成株式会社 | 2022-11-01 | — | — | CN | disclosed |
| CN-114967331-A | Photosensitive dry film | 旭化成株式会社 | 2022-08-30 | — | — | CN | disclosed |
| CN-114174922-A | Photosensitive resin composition and photosensitive element | 旭化成株式会社 | 2022-03-11 | — | — | CN | disclosed |