SCHEMBL6935529

SCHEMBL6935529

COc1cccc(C2=NC(c3c(F)ccc(F)c3F)(C3(c4c(F)ccc(F)c4F)N=C(c4cccc(OC)c4)C(c4cccc(OC)c4)=N3)N=C2c2cccc(OC)c2)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADORA2A P29274 2/20 0.44
ADORA1 P30542 1/20 0.44
DYRK1A Q13627 1/20 0.43
CLK4 Q9HAZ1 1/20 0.43
NPC1 O15118 1/20 0.41
POLB P06746 1/20 0.41
HTT P42858 1/20 0.41
RAB9A P51151 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
KDM1A O60341 2/20 0.40
KDM1B Q8NB78 2/20 0.40
MAOB P27338 2/20 0.40
AKR1C3 P42330 2/20 0.40
AKR1C2 P52895 2/20 0.40
RPS6KA3 P51812 1/20 0.40
KDM4E B2RXH2 1/20 0.39
LMNA P02545 1/20 0.39
MAPT P10636 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
NPY5R Q15761 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29508334 1.00 ADORA2A (0.44) ADORA2AADORA1DYRK1ACLK4NPC1
SCHEMBL6937126 0.90 DYRK1A (0.46) ADORA2AADORA1DYRK1ACLK4KDM1A
SCHEMBL29579894 0.90 DYRK1A (0.46) ADORA2AADORA1DYRK1ACLK4KDM1A
SCHEMBL29508331 0.87 DYRK1A (0.42) ADORA2AADORA1DYRK1ACLK4KDM1A
SCHEMBL6937881 0.87 DYRK1A (0.42) ADORA2AADORA1DYRK1ACLK4KDM1A
SCHEMBL30040209 0.87 DYRK1A (0.46) ADORA2AADORA1DYRK1ACLK4NPC1
SCHEMBL6940381 0.87 DYRK1A (0.46) ADORA2AADORA1DYRK1ACLK4NPC1
SCHEMBL6935907 0.86 ADORA2A (0.43) ADORA2AADORA1DYRK1ACLK4NPC1
SCHEMBL29888758 0.86 ADORA2A (0.43) ADORA2AADORA1DYRK1ACLK4NPC1
SCHEMBL6935491 0.84 DYRK1A (0.44) ADORA2AADORA1DYRK1ACLK4KDM1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260147277-A1 TRANSFER FILM, PATTERN FORMING METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE FUJIFILM CORPORATION (JP) 2026-05-28 US disclosed
WO-2026100708-A1 PHOTOSENSITIVE RESIN LAMINATE, PHOTOSENSITIVE ELEMENT, AND PATTERN FORMING METHOD 旭化成株式会社 2026-05-15 WO disclosed
WO-2025105281-A1 PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, LAMINATE PRODUCTION METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE 富士フイルム株式会社 2025-05-22 WO disclosed
WO-2025095102-A1 PHOTOSENSITIVE RESIN LAMINATE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING WIRING BOARD HAVING CONDUCTOR PATTERN 旭化成株式会社 2025-05-08 WO disclosed
WO-2025074970-A1 PHOTOSENSITIVE RESIN LAMINATE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING BOARD 旭化成株式会社 2025-04-10 WO disclosed
WO-2025047730-A1 TRANSFER FILM, PATTERN FORMATION METHOD, LAMINATE, SEMICONDUCTOR PACKAGE 富士フイルム株式会社 2025-03-06 WO disclosed
WO-2025005146-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, METHOD FOR FORMING RESIST PATTERN, AND LIKE 旭化成株式会社 2025-01-02 WO disclosed
WO-2024214816-A1 PHOTOSENSITIVE RESIN LAMINATE AND METHOD FOR FORMING RESIST PATTERN 旭化成株式会社 2024-10-17 WO disclosed
WO-2024177101-A1 PHOTOSENSITIVE ELEMENT AND METHOD FOR FORMING RESIST PATTERN 旭化成株式会社 2024-08-29 WO disclosed
WO-2024085254-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN MULTILAYER BODY, AND METHOD FOR FORMING RESIST PATTERN 旭化成株式会社 2024-04-25 WO disclosed
US-20240059803-A1 PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-02-22 US disclosed
WO-2023136333-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, AND RESIST PATTERN FORMATION METHOD 旭化成株式会社 2023-07-20 WO disclosed
CN-110325913-B Photosensitive resin composition 旭化成株式会社 2022-11-01 CN disclosed
WO-2022186389-A1 PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME 旭化成株式会社 2022-09-09 WO disclosed
US-6524770-B1 For polyimide precursor curable under patternwise low radiation; heat and chemical resistance; polyamide having unsaturated ester pendant groups cures HITACHI CHEMICAL CO., LTD. (JP) 2003-02-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260147277-A1 TRANSFER FILM, PATTERN FORMING METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE LCP1, PCNA, FDFT1 ADORA2A 4643/4885ADORA1 4261/4885DYRK1A 3660/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.