Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DYRK1A | Q13627 | 1/20 | 0.46 |
| ▸ | CLK4 | Q9HAZ1 | 1/20 | 0.46 |
| ▸ | ADORA2A | P29274 | 2/20 | 0.44 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.44 |
| ▸ | KDM1A | O60341 | 2/20 | 0.43 |
| ▸ | KDM1B | Q8NB78 | 2/20 | 0.43 |
| ▸ | AKR1C3 | P42330 | 2/20 | 0.42 |
| ▸ | AKR1C2 | P52895 | 2/20 | 0.42 |
| ▸ | RPS6KA3 | P51812 | 1/20 | 0.42 |
| ▸ | XDH | P47989 | 1/20 | 0.41 |
| ▸ | NPY5R | Q15761 | 1/20 | 0.41 |
| ▸ | MAOB | P27338 | 2/20 | 0.41 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.41 |
| ▸ | BACE1 | P56817 | 1/20 | 0.41 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.41 |
| ▸ | CYP1A1 | P04798 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | CYP2E1 | P05181 | 1/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | CYP2C8 | P10632 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29579894 | 1.00 | DYRK1A (0.46) | DYRK1ACLK4ADORA2AADORA1KDM1A | |
| SCHEMBL6935491 | 0.91 | DYRK1A (0.44) | DYRK1ACLK4ADORA2AADORA1KDM1A | |
| SCHEMBL29508349 | 0.91 | DYRK1A (0.44) | DYRK1ACLK4ADORA2AADORA1KDM1A | |
| SCHEMBL29508334 | 0.90 | ADORA2A (0.44) | DYRK1ACLK4ADORA2AADORA1KDM1A | |
| SCHEMBL6935529 | 0.90 | ADORA2A (0.44) | DYRK1ACLK4ADORA2AADORA1KDM1A | |
| SCHEMBL30040209 | 0.88 | DYRK1A (0.46) | DYRK1ACLK4ADORA2AADORA1KDM1A | |
| SCHEMBL6940381 | 0.88 | DYRK1A (0.46) | DYRK1ACLK4ADORA2AADORA1KDM1A | |
| SCHEMBL29417503 | 0.87 | DYRK1A (0.43) | DYRK1ACLK4ADORA2AADORA1KDM1A | |
| SCHEMBL6941655 | 0.87 | DYRK1A (0.43) | DYRK1ACLK4ADORA2AADORA1KDM1A | |
| SCHEMBL6937881 | 0.85 | DYRK1A (0.42) | DYRK1ACLK4ADORA2AADORA1KDM1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260147277-A1 | TRANSFER FILM, PATTERN FORMING METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE | FUJIFILM CORPORATION (JP) | 2026-05-28 | — | — | US | disclosed |
| WO-2026100708-A1 | PHOTOSENSITIVE RESIN LAMINATE, PHOTOSENSITIVE ELEMENT, AND PATTERN FORMING METHOD | 旭化成株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2025105281-A1 | PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, LAMINATE PRODUCTION METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE | 富士フイルム株式会社 | 2025-05-22 | — | — | WO | disclosed |
| WO-2025095102-A1 | PHOTOSENSITIVE RESIN LAMINATE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING WIRING BOARD HAVING CONDUCTOR PATTERN | 旭化成株式会社 | 2025-05-08 | — | — | WO | disclosed |
| WO-2025047730-A1 | TRANSFER FILM, PATTERN FORMATION METHOD, LAMINATE, SEMICONDUCTOR PACKAGE | 富士フイルム株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2025005146-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, METHOD FOR FORMING RESIST PATTERN, AND LIKE | 旭化成株式会社 | 2025-01-02 | — | — | WO | disclosed |
| WO-2024214816-A1 | PHOTOSENSITIVE RESIN LAMINATE AND METHOD FOR FORMING RESIST PATTERN | 旭化成株式会社 | 2024-10-17 | — | — | WO | disclosed |
| WO-2024177101-A1 | PHOTOSENSITIVE ELEMENT AND METHOD FOR FORMING RESIST PATTERN | 旭化成株式会社 | 2024-08-29 | — | — | WO | disclosed |
| WO-2024085254-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN MULTILAYER BODY, AND METHOD FOR FORMING RESIST PATTERN | 旭化成株式会社 | 2024-04-25 | — | — | WO | disclosed |
| US-20240059803-A1 | PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-02-22 | — | — | US | disclosed |
| WO-2023136333-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, AND RESIST PATTERN FORMATION METHOD | 旭化成株式会社 | 2023-07-20 | — | — | WO | disclosed |
| US-6524770-B1 | For polyimide precursor curable under patternwise low radiation; heat and chemical resistance; polyamide having unsaturated ester pendant groups cures | HITACHI CHEMICAL CO., LTD. (JP) | 2003-02-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260147277-A1 | TRANSFER FILM, PATTERN FORMING METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE | LCP1, PCNA, FDFT1 | DYRK1A 3660/4885CLK4 4144/4885ADORA2A 4643/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.