SCHEMBL2951024

SCHEMBL2951024

O=S(=O)(CCCCCCCCCCS(=O)(=O)C1CCCCC1)C1CCCCC1

nearest known ligand 0.37

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.32
CA12 O43570 1/20 0.32
CA7 P43166 1/20 0.32
CA14 Q9ULX7 1/20 0.32
ALOX5AP P20292 1/20 0.32
FEN1 P39748 1/20 0.32
LOXL2 Q9Y4K0 2/20 0.31
LOX P28300 1/20 0.31
MMP1 P03956 1/20 0.30
MMP7 P09237 1/20 0.30
MMP12 P39900 1/20 0.30
ECE1 P42892 1/20 0.30
MMP13 P45452 1/20 0.30
CA2 P00918 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL777574 0.97 CA1 (0.33) CA1CA12CA7CA14ALOX5AP
SCHEMBL778711 0.95 ALOX5AP (0.31) ALOX5APFEN1
SCHEMBL24017647 0.89 ALDH1A1 (0.33) ALOX5APFEN1
SCHEMBL10904086 0.89 FAAH (0.43) MMP1MMP7MMP12ECE1MMP13
SCHEMBL20169603 0.89 FAAH (0.43) MMP1MMP7MMP12ECE1MMP13
SCHEMBL14370975 0.87 FAAH (0.45) MMP1MMP7MMP12ECE1MMP13
SCHEMBL8142928 0.87 APP (0.38) ALOX5APFEN1MMP1MMP7MMP12
SCHEMBL11332467 0.84 ABCC4 (0.33)
SCHEMBL8147652 0.84 EPHX1 (0.33) CA1CA12CA7CA14ALOX5AP
SCHEMBL23149821 0.84 CYP1A2 (0.41) MMP1MMP7MMP12ECE1MMP13

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100280201-A1 POLYMERS CONTAINING QUATERNIZED NITROGEN CORNELL RESEARCH FOUNDATION, INC. (US) 2010-11-04 US disclosed
US-7763412-B2 Polymer, positive resist composition and method for forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2010-07-27 US disclosed
US-7763687-B2 Polymers containing quaternized nitrogen CORNELL RESEARCH FOUNDATION, INC. (US) 2010-07-27 US disclosed
US-20080063975-A1 Polymer, Positive Resist Composition and Method for Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD (JP) 2008-03-13 US disclosed
US-20070106040-A1 Polymers containing quaternized nitrogen REGENTS OF THE UNIVERSITY OF CALIFORNIA, THE 2007-05-10 US disclosed