SCHEMBL29520588

SCHEMBL29520588

CCCCCCCCc1ccccc1OP(Oc1ccccc1CCCCCCCC)Oc1ccccc1CCCCCCCC

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRA P10827 1/20 0.59
THRB P10828 1/20 0.59
LIPG Q9Y5X9 1/20 0.53
ALOX5 P09917 1/20 0.51
PTGS2 P35354 1/20 0.51
PPARA Q07869 3/20 0.49
NR1H2 P55055 1/20 0.47
NR1H3 Q13133 1/20 0.47
PPARG P37231 2/20 0.47
BID P55957 3/20 0.41
MCL1 Q07820 3/20 0.41
BCL2L1 Q07817 2/20 0.41
BAK1 Q16611 2/20 0.41
KAT8 Q9H7Z6 2/20 0.41
EP300 Q09472 1/20 0.41
KAT2A Q92830 1/20 0.41
KAT2B Q92831 1/20 0.41
KAT5 Q92993 1/20 0.41
SAE1 Q9UBE0 1/20 0.41
LTB4R Q15722 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8056380 1.00 THRA (0.59) THRATHRBLIPGALOX5PTGS2
SCHEMBL29438036 1.00 THRA (0.59) THRATHRBLIPGALOX5PTGS2
SCHEMBL39062 1.00 THRA (0.59) THRATHRBLIPGALOX5PTGS2
SCHEMBL4004612 1.00 THRA (0.59) THRATHRBLIPGALOX5PTGS2
SCHEMBL4009772 1.00 THRA (0.59) THRATHRBLIPGALOX5PTGS2
SCHEMBL11674754 1.00 THRA (0.59) THRATHRBLIPGALOX5PTGS2
SCHEMBL8393505 1.00 THRA (0.59) THRATHRBLIPGALOX5PTGS2
SCHEMBL1100557 1.00 THRA (0.59) THRATHRBLIPGALOX5PTGS2
SCHEMBL6849772 1.00 THRA (0.59) THRATHRBLIPGALOX5PTGS2
Hydrogen Sulfide SCHEMBL18249351 0.98 THRA (0.57) THRATHRBLIPGALOX5PTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119708919-A Curable inkjet composition for metal-containing substrate, solder resist, and inkjet recording method 柯尼卡美能达株式会社 2025-03-28 CN disclosed
CN-119439625-A Negative photosensitive resin composition, pattern forming method, cured coating film forming method, interlayer insulating film, surface protective film, and electronic component 信越化学工业株式会社 2025-02-14 CN disclosed
CN-114253069-A Photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, and surface protective film 信越化学工业株式会社 2022-03-29 CN disclosed