Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRA | P10827 | 1/20 | 0.59 |
| ▸ | THRB | P10828 | 1/20 | 0.59 |
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.53 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.51 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.51 |
| ▸ | PPARA | Q07869 | 3/20 | 0.49 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.47 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.47 |
| ▸ | PPARG | P37231 | 2/20 | 0.47 |
| ▸ | BID | P55957 | 3/20 | 0.41 |
| ▸ | MCL1 | Q07820 | 3/20 | 0.41 |
| ▸ | BCL2L1 | Q07817 | 2/20 | 0.41 |
| ▸ | BAK1 | Q16611 | 2/20 | 0.41 |
| ▸ | KAT8 | Q9H7Z6 | 2/20 | 0.41 |
| ▸ | EP300 | Q09472 | 1/20 | 0.41 |
| ▸ | KAT2A | Q92830 | 1/20 | 0.41 |
| ▸ | KAT2B | Q92831 | 1/20 | 0.41 |
| ▸ | KAT5 | Q92993 | 1/20 | 0.41 |
| ▸ | SAE1 | Q9UBE0 | 1/20 | 0.41 |
| ▸ | LTB4R | Q15722 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8056380 | 1.00 | THRA (0.59) | THRATHRBLIPGALOX5PTGS2 | |
| SCHEMBL29438036 | 1.00 | THRA (0.59) | THRATHRBLIPGALOX5PTGS2 | |
| SCHEMBL39062 | 1.00 | THRA (0.59) | THRATHRBLIPGALOX5PTGS2 | |
| SCHEMBL29520588 | 1.00 | THRA (0.59) | THRATHRBLIPGALOX5PTGS2 | |
| SCHEMBL4004612 | 1.00 | THRA (0.59) | THRATHRBLIPGALOX5PTGS2 | |
| SCHEMBL4009772 | 1.00 | THRA (0.59) | THRATHRBLIPGALOX5PTGS2 | |
| SCHEMBL11674754 | 1.00 | THRA (0.59) | THRATHRBLIPGALOX5PTGS2 | |
| SCHEMBL8393505 | 1.00 | THRA (0.59) | THRATHRBLIPGALOX5PTGS2 | |
| SCHEMBL6849772 | 1.00 | THRA (0.59) | THRATHRBLIPGALOX5PTGS2 | |
| Hydrogen Sulfide SCHEMBL18249351 | 0.98 | THRA (0.57) | THRATHRBLIPGALOX5PTGS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 227 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0061160-B1 | STABILIZED NITRILE POLYMER | POLYSAR LIMITED (CA) | 1985-09-25 | — | — | EP | claimed |
| EP-0061160-A1 | Stabilized nitrile polymer | POLYSAR LIMITED (CA) | 1982-09-29 | — | — | EP | claimed |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| US-20260098129-A1 | THERMOPLASTIC RESIN AND MOLDED BODY CONTAINING THERMOPLASTIC RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2026-04-09 | — | — | US | disclosed |
| US-20260071030-A1 | THERMOPLASTIC RESIN, MOLDED BODY CONTAINING THERMOPLASTIC RESIN, AND OPTICAL LENS | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2026-03-12 | — | — | US | disclosed |
| US-20260062520-A1 | THERMOPLASTIC RESIN AND MOLDED OBJECT INCLUDING THERMOPLASTIC RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2026-03-05 | — | — | US | disclosed |
| EP-4660704-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250355350-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-20 | — | — | US | disclosed |
| EP-4650874-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-19 | — | — | EP | disclosed |
| EP-4636485-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-10-22 | — | — | EP | disclosed |
| EP-4636011-A1 | POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-10-22 | — | — | EP | disclosed |
| EP-0049133-A1 | Stabilizing composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1982-04-07 | — | — | EP | disclosed |
| EP-0038183-A1 | Polyphenylene ether resin compositions and shaped articles thereof | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1981-10-21 | — | — | EP | disclosed |
| EP-0036278-A1 | Polyphenylene ether resin composition of improved heat stability and shaped articles thereof | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1981-09-23 | — | — | EP | disclosed |
| US-4178282-A | ALKALI OR ALKALINE EARTH METAL SOAPS OR PHENOLATES OR ZINC HALIDES IN ALCOHOLS OR ORGANOPHOSPHITES | CLAREMONT POLYCHEMICAL CORPORATION (US) | 1979-12-11 | — | — | US | disclosed |
| US-4117029-A | VINYL CHLORIDE POLYE | NITTO KASEI CO. LTD. (JP) | 1978-09-26 | — | — | US | disclosed |
| US-4042549-A | Improve stabilizers for vinyl halide resins containing a metal halide and an ethoxylated alkylphenol | EMERY INDUSTRIES, INC. (US) | 1977-08-16 | — | — | US | disclosed |
| US-4013618-A | NITROGEN-CONTAINING STABILIZER | TOYOBO CO., LTD. (JA) | 1977-03-22 | — | — | US | disclosed |
| US-3984940-A | Degradable plastic | REICH MURRAY | 1976-10-12 | — | — | US | disclosed |
| US-3943081-A | ALKALINE EARTH METAL SOAP OR PHENOLATE, ZINC CHLORIDE, HYDROXY COMPOUND, ORGANOPHOSPHITE | CLAREMONT POLYCHEMICAL CORPORATION (US) | 1976-03-09 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | ARCN1, PRDM9, LBR | THRA 2774/4885THRB 3424/4885LIPG 4510/4885 |
| US-20260062520-A1 | THERMOPLASTIC RESIN AND MOLDED OBJECT INCLUDING THERMOPLASTIC RESIN | RER1, PUF60, SEM1 | THRA 281/4885THRB 1299/4885LIPG 4855/4885 |
| US-20260071030-A1 | THERMOPLASTIC RESIN, MOLDED BODY CONTAINING THERMOPLASTIC RESIN, AND OPTICAL LENS | DERL1, WDR1, RIF1 | THRA 1810/4885THRB 3063/4885LIPG 3970/4885 |
| US-20260098129-A1 | THERMOPLASTIC RESIN AND MOLDED BODY CONTAINING THERMOPLASTIC RESIN | RER1, EIF2AK1, RIOK1 | THRA 603/4885THRB 2077/4885LIPG 4757/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.