Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL123954 | 0.83 | ACHE (0.41) | ACHENFE2L2 | |
| SCHEMBL29830966 | 0.81 | ACHE (0.39) | ACHENFE2L2 | |
| Silver SCHEMBL1450856 | 0.81 | ACHE (0.39) | ACHENFE2L2 | |
| SCHEMBL1452107 | 0.81 | ACHE (0.39) | ACHENFE2L2 | |
| Lithium Ion SCHEMBL912832 | 0.81 | ACHE (0.39) | ACHENFE2L2 | |
| SCHEMBL1450796 | 0.81 | ACHE (0.39) | ACHENFE2L2 | |
| Lithium Ion SCHEMBL29567735 | 0.81 | ACHE (0.39) | ACHENFE2L2 | |
| Bromide SCHEMBL7211405 | 0.79 | ACHE (0.38) | ACHENFE2L2 | |
| Bromide SCHEMBL7211403 | 0.79 | ACHE (0.38) | ACHENFE2L2 | |
| SCHEMBL20841980 | 0.75 | ACHE (0.35) | ACHENFE2L2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250298315-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COATING, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-25 | — | — | US | disclosed |
| CN-120202438-A | Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film, pattern forming method and light emitting element | 信越化学工业株式会社 | 2025-06-24 | — | — | CN | disclosed |
| CN-120092212-A | Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film, pattern forming method and light emitting element | 信越化学工业株式会社 | 2025-06-03 | — | — | CN | disclosed |
| CN-120019329-A | Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film, pattern forming method and light emitting element | 信越化学工业株式会社 | 2025-05-16 | — | — | CN | disclosed |
| CN-119987132-A | Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film and pattern forming method | 信越化学工业株式会社 | 2025-05-13 | — | — | CN | disclosed |
| CN-111142332-B | Photosensitive resin composition and photosensitive dry film | 信越化学工业株式会社 | 2024-10-29 | — | — | CN | disclosed |
| CN-110297398-B | Photosensitive resin composition, photosensitive resin laminate, and pattern forming method | 信越化学工业株式会社 | 2024-10-08 | — | — | CN | disclosed |
| CN-118103774-A | Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, and pattern forming method | 信越化学工业株式会社 | 2024-05-28 | — | — | CN | disclosed |
| CN-117794985-A | Polymer containing silicon phenylene skeleton, photosensitive resin composition, pattern forming method, and method for producing optical semiconductor element | 信越化学工业株式会社 | 2024-03-29 | — | — | CN | disclosed |
| CN-111381447-B | Photosensitive resin composition, laminate, and pattern forming method | 信越化学工业株式会社 | 2024-03-08 | — | — | CN | disclosed |
| CN-117120927-A | Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film, and pattern forming method | 信越化学工业株式会社 | 2023-11-24 | — | — | CN | disclosed |
| CN-111234236-B | Siloxane polymer containing isocyanuric acid and polyether skeleton, photosensitive resin composition, and pattern formation method | 信越化学工业株式会社 | 2023-03-24 | — | — | CN | disclosed |
| CN-111205463-B | Polysiloxane skeleton polymer, photosensitive resin composition, pattern forming method and manufacturing of optical semiconductor device | 信越化学工业株式会社 | 2023-02-14 | — | — | CN | disclosed |
| CN-115023653-A | Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film, and pattern formation method | 信越化学工业株式会社 | 2022-09-06 | — | — | CN | disclosed |
| CN-114746809-A | Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film, pattern forming method, and light-emitting element | 信越化学工业株式会社 | 2022-07-12 | — | — | CN | disclosed |
| CN-109422881-B | Epoxy group-containing isocyanurate-modified silicone resin, photosensitive resin composition, photosensitive dry film, laminate, and pattern formation method | 信越化学工业株式会社 | 2022-04-19 | — | — | CN | disclosed |
| CN-114253069-A | Photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, and surface protective film | 信越化学工业株式会社 | 2022-03-29 | — | — | CN | disclosed |